JPS5538098A - Method of increasing gettering effect existing in semiconductor substrate bulk - Google Patents
Method of increasing gettering effect existing in semiconductor substrate bulkInfo
- Publication number
- JPS5538098A JPS5538098A JP11437479A JP11437479A JPS5538098A JP S5538098 A JPS5538098 A JP S5538098A JP 11437479 A JP11437479 A JP 11437479A JP 11437479 A JP11437479 A JP 11437479A JP S5538098 A JPS5538098 A JP S5538098A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor substrate
- gettering effect
- substrate bulk
- effect existing
- increasing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005247 gettering Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- 239000000758 substrate Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic System
- H01L29/167—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic System further characterised by the doping material
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/322—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to modify their internal properties, e.g. to produce internal imperfections
- H01L21/3221—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to modify their internal properties, e.g. to produce internal imperfections of silicon bodies, e.g. for gettering
- H01L21/3225—Thermally inducing defects using oxygen present in the silicon body for intrinsic gettering
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/023—Deep level dopants
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/024—Defect control-gettering and annealing
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7826223A FR2435818A1 (fr) | 1978-09-08 | 1978-09-08 | Procede pour accroitre l'effet de piegeage interne des corps semi-conducteurs |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5538098A true JPS5538098A (en) | 1980-03-17 |
Family
ID=9212579
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11437479A Pending JPS5538098A (en) | 1978-09-08 | 1979-09-07 | Method of increasing gettering effect existing in semiconductor substrate bulk |
Country Status (5)
Country | Link |
---|---|
US (1) | US4220483A (ja) |
EP (1) | EP0008661B1 (ja) |
JP (1) | JPS5538098A (ja) |
DE (1) | DE2966258D1 (ja) |
FR (1) | FR2435818A1 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS575364A (en) * | 1980-06-13 | 1982-01-12 | Nec Kyushu Ltd | Mos integrated circuit device |
JPS57128037A (en) * | 1981-01-30 | 1982-08-09 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS57141931A (en) * | 1981-02-25 | 1982-09-02 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS6066827A (ja) * | 1983-09-24 | 1985-04-17 | Mitsubishi Metal Corp | シリコンウエハ−中への結晶欠陥導入制御法 |
Families Citing this family (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS583375B2 (ja) * | 1979-01-19 | 1983-01-21 | 超エル・エス・アイ技術研究組合 | シリコン単結晶ウエハ−の製造方法 |
FR2460479A1 (fr) * | 1979-06-29 | 1981-01-23 | Ibm France | Procede de caracterisation de la teneur en oxygene des barreaux de silicium tires selon la methode czochralski |
JPS5680139A (en) * | 1979-12-05 | 1981-07-01 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Manufacture of semiconductor device |
US4597804A (en) * | 1981-03-11 | 1986-07-01 | Fujitsu Limited | Methods of forming denuded zone in wafer by intrinsic gettering and forming bipolar transistor therein |
JPS5814538A (ja) * | 1981-07-17 | 1983-01-27 | Fujitsu Ltd | 半導体装置の製造方法 |
JPS58501927A (ja) * | 1981-12-31 | 1983-11-10 | インタ−ナシヨナル・ビジネス・マシ−ンズ・コ−ポレ−シヨン | シリコン・ウエハ中の酸素析出を減少させるための方法 |
US4401505A (en) * | 1982-03-31 | 1983-08-30 | The United States Of America As Represented By The Administrator National Aeronautics And Space Administration | Method of increasing minority carrier lifetime in silicon web or the like |
US4447497A (en) * | 1982-05-03 | 1984-05-08 | Rockwell International Corporation | CVD Process for producing monocrystalline silicon-on-cubic zirconia and article produced thereby |
US4459159A (en) * | 1982-09-29 | 1984-07-10 | Mara William C O | Method for making semi-insulating substrate by post-process heating of oxygenated and doped silicon |
JPS59124136A (ja) * | 1982-12-28 | 1984-07-18 | Toshiba Corp | 半導体ウエハの処理方法 |
US4548654A (en) * | 1983-06-03 | 1985-10-22 | Motorola, Inc. | Surface denuding of silicon wafer |
JPS6046022A (ja) * | 1983-08-23 | 1985-03-12 | Sumitomo Electric Ind Ltd | イオン注入用基板の前処理方法 |
US4505759A (en) * | 1983-12-19 | 1985-03-19 | Mara William C O | Method for making a conductive silicon substrate by heat treatment of oxygenated and lightly doped silicon single crystals |
US4698486A (en) * | 1984-02-28 | 1987-10-06 | Tamarack Scientific Co., Inc. | Method of heating semiconductor wafers in order to achieve annealing, silicide formation, reflow of glass passivation layers, etc. |
US4727044A (en) | 1984-05-18 | 1988-02-23 | Semiconductor Energy Laboratory Co., Ltd. | Method of making a thin film transistor with laser recrystallized source and drain |
US4668330A (en) * | 1985-12-05 | 1987-05-26 | Monsanto Company | Furnace contamination |
US4859938A (en) * | 1986-05-05 | 1989-08-22 | Intel Corporation | Novel technique to detect oxydonor generation in IC fabrication |
JP2575545B2 (ja) * | 1990-07-05 | 1997-01-29 | 株式会社東芝 | 半導体装置の製造方法 |
JPH0750713B2 (ja) * | 1990-09-21 | 1995-05-31 | コマツ電子金属株式会社 | 半導体ウェーハの熱処理方法 |
EP0502471A3 (en) * | 1991-03-05 | 1995-10-11 | Fujitsu Ltd | Intrinsic gettering of a silicon substrate |
JPH0684925A (ja) * | 1992-07-17 | 1994-03-25 | Toshiba Corp | 半導体基板およびその処理方法 |
US6491752B1 (en) * | 1999-07-16 | 2002-12-10 | Sumco Oregon Corporation | Enhanced n-type silicon material for epitaxial wafer substrate and method of making same |
US6594446B2 (en) | 2000-12-04 | 2003-07-15 | Vortek Industries Ltd. | Heat-treating methods and systems |
KR101067901B1 (ko) | 2001-12-26 | 2011-09-28 | 맷슨 테크날러지 캐나다 인코퍼레이티드 | 온도 측정 및 열처리 방법과 시스템 |
KR20120045040A (ko) | 2002-12-20 | 2012-05-08 | 맷슨 테크날러지 캐나다 인코퍼레이티드 | 피가공물 지지 방법 |
WO2005059991A1 (en) | 2003-12-19 | 2005-06-30 | Mattson Technology Canada Inc. | Apparatuses and methods for suppressing thermally induced motion of a workpiece |
CN101401208A (zh) * | 2006-03-15 | 2009-04-01 | 皇家飞利浦电子股份有限公司 | 用于辐射检测的半导体器件 |
US8454356B2 (en) | 2006-11-15 | 2013-06-04 | Mattson Technology, Inc. | Systems and methods for supporting a workpiece during heat-treating |
JP5718809B2 (ja) | 2008-05-16 | 2015-05-13 | マトソン テクノロジー、インコーポレイテッド | 加工品の破壊を防止する方法および装置 |
DE102010023221A1 (de) * | 2010-06-09 | 2011-12-15 | Sovello Ag | Verfahren zur Herstellung von Photovoltaikmodulen |
CN106960782A (zh) * | 2017-03-31 | 2017-07-18 | 上海先进半导体制造股份有限公司 | 半导体衬底的防漏电方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE684801A (ja) * | 1965-08-05 | 1967-01-03 | ||
US3615873A (en) * | 1969-06-03 | 1971-10-26 | Sprague Electric Co | Method of stabilizing mos devices |
US3723053A (en) * | 1971-10-26 | 1973-03-27 | Myers Platter S | Heat treating process for semiconductor fabrication |
FR2191272A1 (ja) * | 1972-06-27 | 1974-02-01 | Ibm France | |
US3829335A (en) * | 1972-10-20 | 1974-08-13 | Scient Micro Syst Inc | Method for processing semiconductor wafers |
US3905162A (en) * | 1974-07-23 | 1975-09-16 | Silicon Material Inc | Method of preparing high yield semiconductor wafer |
IN140598B (ja) * | 1974-08-02 | 1976-12-04 | Rca Corp | |
US3997368A (en) * | 1975-06-24 | 1976-12-14 | Bell Telephone Laboratories, Incorporated | Elimination of stacking faults in silicon devices: a gettering process |
US4053335A (en) * | 1976-04-02 | 1977-10-11 | International Business Machines Corporation | Method of gettering using backside polycrystalline silicon |
US4144099A (en) * | 1977-10-31 | 1979-03-13 | International Business Machines Corporation | High performance silicon wafer and fabrication process |
-
1978
- 1978-09-08 FR FR7826223A patent/FR2435818A1/fr active Granted
-
1979
- 1979-07-25 DE DE7979102641T patent/DE2966258D1/de not_active Expired
- 1979-07-25 EP EP79102641A patent/EP0008661B1/fr not_active Expired
- 1979-08-14 US US06/066,593 patent/US4220483A/en not_active Expired - Lifetime
- 1979-09-07 JP JP11437479A patent/JPS5538098A/ja active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS575364A (en) * | 1980-06-13 | 1982-01-12 | Nec Kyushu Ltd | Mos integrated circuit device |
JPS57128037A (en) * | 1981-01-30 | 1982-08-09 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS57141931A (en) * | 1981-02-25 | 1982-09-02 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS6066827A (ja) * | 1983-09-24 | 1985-04-17 | Mitsubishi Metal Corp | シリコンウエハ−中への結晶欠陥導入制御法 |
JPH0469422B2 (ja) * | 1983-09-24 | 1992-11-06 | Mitsubishi Materials Corp |
Also Published As
Publication number | Publication date |
---|---|
US4220483A (en) | 1980-09-02 |
DE2966258D1 (en) | 1983-11-10 |
EP0008661B1 (fr) | 1983-10-05 |
FR2435818B1 (ja) | 1982-06-04 |
EP0008661A1 (fr) | 1980-03-19 |
FR2435818A1 (fr) | 1980-04-04 |
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