JPS5538029B2 - - Google Patents

Info

Publication number
JPS5538029B2
JPS5538029B2 JP6066075A JP6066075A JPS5538029B2 JP S5538029 B2 JPS5538029 B2 JP S5538029B2 JP 6066075 A JP6066075 A JP 6066075A JP 6066075 A JP6066075 A JP 6066075A JP S5538029 B2 JPS5538029 B2 JP S5538029B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP6066075A
Other versions
JPS51135882A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6066075A priority Critical patent/JPS51135882A/ja
Priority to GB4345975A priority patent/GB1483966A/en
Priority to US05/625,041 priority patent/US4152478A/en
Priority to DE2547552A priority patent/DE2547552B2/de
Publication of JPS51135882A publication Critical patent/JPS51135882A/ja
Priority to US06/011,917 priority patent/US4217855A/en
Publication of JPS5538029B2 publication Critical patent/JPS5538029B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/221Ion beam deposition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP6066075A 1974-10-23 1975-05-20 Process for supplying continu ously evaporating substance Granted JPS51135882A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP6066075A JPS51135882A (en) 1975-05-20 1975-05-20 Process for supplying continu ously evaporating substance
GB4345975A GB1483966A (en) 1974-10-23 1975-10-22 Vapourized-metal cluster ion source and ionized-cluster beam deposition
US05/625,041 US4152478A (en) 1974-10-23 1975-10-23 Ionized-cluster deposited on a substrate and method of depositing ionized cluster on a substrate
DE2547552A DE2547552B2 (de) 1974-10-23 1975-10-23 Schichtaufdampfverfahren und -einrichtung
US06/011,917 US4217855A (en) 1974-10-23 1979-02-13 Vaporized-metal cluster ion source and ionized-cluster beam deposition device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6066075A JPS51135882A (en) 1975-05-20 1975-05-20 Process for supplying continu ously evaporating substance

Publications (2)

Publication Number Publication Date
JPS51135882A JPS51135882A (en) 1976-11-25
JPS5538029B2 true JPS5538029B2 (ja) 1980-10-01

Family

ID=13148704

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6066075A Granted JPS51135882A (en) 1974-10-23 1975-05-20 Process for supplying continu ously evaporating substance

Country Status (1)

Country Link
JP (1) JPS51135882A (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6246029A (ja) * 1985-08-23 1987-02-27 Sanden Corp 電磁クラツチ
JPS6249025A (ja) * 1985-08-27 1987-03-03 Sanden Corp 電磁クラツチ
JPS6345429U (ja) * 1986-09-05 1988-03-26
JPH022091Y2 (ja) * 1982-11-10 1990-01-18

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6097765U (ja) * 1983-12-05 1985-07-03 株式会社エイコーエンデニアリング 真空蒸着用蒸発装置
JPH03170662A (ja) * 1989-11-29 1991-07-24 Matsushita Electric Ind Co Ltd 蒸着装置および蒸着方法
KR100984148B1 (ko) * 2007-12-21 2010-09-28 삼성전기주식회사 소스량 제어가 가능한 진공증착장치
JP5621269B2 (ja) * 2010-02-09 2014-11-12 パナソニック株式会社 蒸着用ボートおよびこれを用いた蒸着装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5155787A (en) * 1974-11-11 1976-05-17 Copal Co Ltd Shinkujochakuhoho oyobi sochi

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5155787A (en) * 1974-11-11 1976-05-17 Copal Co Ltd Shinkujochakuhoho oyobi sochi

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH022091Y2 (ja) * 1982-11-10 1990-01-18
JPS6246029A (ja) * 1985-08-23 1987-02-27 Sanden Corp 電磁クラツチ
JPS6249025A (ja) * 1985-08-27 1987-03-03 Sanden Corp 電磁クラツチ
JPS6345429U (ja) * 1986-09-05 1988-03-26

Also Published As

Publication number Publication date
JPS51135882A (en) 1976-11-25

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