JPS5538029B2 - - Google Patents
Info
- Publication number
- JPS5538029B2 JPS5538029B2 JP6066075A JP6066075A JPS5538029B2 JP S5538029 B2 JPS5538029 B2 JP S5538029B2 JP 6066075 A JP6066075 A JP 6066075A JP 6066075 A JP6066075 A JP 6066075A JP S5538029 B2 JPS5538029 B2 JP S5538029B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/221—Ion beam deposition
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6066075A JPS51135882A (en) | 1975-05-20 | 1975-05-20 | Process for supplying continu ously evaporating substance |
GB4345975A GB1483966A (en) | 1974-10-23 | 1975-10-22 | Vapourized-metal cluster ion source and ionized-cluster beam deposition |
DE2547552A DE2547552B2 (de) | 1974-10-23 | 1975-10-23 | Schichtaufdampfverfahren und -einrichtung |
US05/625,041 US4152478A (en) | 1974-10-23 | 1975-10-23 | Ionized-cluster deposited on a substrate and method of depositing ionized cluster on a substrate |
US06/011,917 US4217855A (en) | 1974-10-23 | 1979-02-13 | Vaporized-metal cluster ion source and ionized-cluster beam deposition device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6066075A JPS51135882A (en) | 1975-05-20 | 1975-05-20 | Process for supplying continu ously evaporating substance |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS51135882A JPS51135882A (en) | 1976-11-25 |
JPS5538029B2 true JPS5538029B2 (US07709020-20100504-C00041.png) | 1980-10-01 |
Family
ID=13148704
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6066075A Granted JPS51135882A (en) | 1974-10-23 | 1975-05-20 | Process for supplying continu ously evaporating substance |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS51135882A (US07709020-20100504-C00041.png) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6246029A (ja) * | 1985-08-23 | 1987-02-27 | Sanden Corp | 電磁クラツチ |
JPS6249025A (ja) * | 1985-08-27 | 1987-03-03 | Sanden Corp | 電磁クラツチ |
JPS6345429U (US07709020-20100504-C00041.png) * | 1986-09-05 | 1988-03-26 | ||
JPH022091Y2 (US07709020-20100504-C00041.png) * | 1982-11-10 | 1990-01-18 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6097765U (ja) * | 1983-12-05 | 1985-07-03 | 株式会社エイコーエンデニアリング | 真空蒸着用蒸発装置 |
JPH03170662A (ja) * | 1989-11-29 | 1991-07-24 | Matsushita Electric Ind Co Ltd | 蒸着装置および蒸着方法 |
KR100984148B1 (ko) * | 2007-12-21 | 2010-09-28 | 삼성전기주식회사 | 소스량 제어가 가능한 진공증착장치 |
JP5621269B2 (ja) * | 2010-02-09 | 2014-11-12 | パナソニック株式会社 | 蒸着用ボートおよびこれを用いた蒸着装置 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5155787A (en) * | 1974-11-11 | 1976-05-17 | Copal Co Ltd | Shinkujochakuhoho oyobi sochi |
-
1975
- 1975-05-20 JP JP6066075A patent/JPS51135882A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5155787A (en) * | 1974-11-11 | 1976-05-17 | Copal Co Ltd | Shinkujochakuhoho oyobi sochi |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH022091Y2 (US07709020-20100504-C00041.png) * | 1982-11-10 | 1990-01-18 | ||
JPS6246029A (ja) * | 1985-08-23 | 1987-02-27 | Sanden Corp | 電磁クラツチ |
JPS6249025A (ja) * | 1985-08-27 | 1987-03-03 | Sanden Corp | 電磁クラツチ |
JPS6345429U (US07709020-20100504-C00041.png) * | 1986-09-05 | 1988-03-26 |
Also Published As
Publication number | Publication date |
---|---|
JPS51135882A (en) | 1976-11-25 |