JPS552971A - Film thickness measuring method - Google Patents
Film thickness measuring methodInfo
- Publication number
- JPS552971A JPS552971A JP7667178A JP7667178A JPS552971A JP S552971 A JPS552971 A JP S552971A JP 7667178 A JP7667178 A JP 7667178A JP 7667178 A JP7667178 A JP 7667178A JP S552971 A JPS552971 A JP S552971A
- Authority
- JP
- Japan
- Prior art keywords
- ray
- layer
- fluorescent
- ion
- film thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
PURPOSE: To enable a film's thickness to be measured by fluorescent X-ray method by pouring a fixed amount of ion on silicon wafer surface in advance of piling of glass layer.
CONSTITUTION: Ion is poured onto surface of a silicon wafer 1 on a fixed condition to form a layer 2 of an impurity such as argon, etc. A glass layer 3, which is an objective of measurement (of thickness), is piled on this impurity layer 2 using CVD or some other method. By radiation of a primary X-ray 4, a fluorescent X-ray 5 is excited at the ion-pouring layer 2. Now, it is possible to measure film thickness of the glass layer 3 by detecting amount of this fluorescent X-ray.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7667178A JPS552971A (en) | 1978-06-23 | 1978-06-23 | Film thickness measuring method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7667178A JPS552971A (en) | 1978-06-23 | 1978-06-23 | Film thickness measuring method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS552971A true JPS552971A (en) | 1980-01-10 |
Family
ID=13611877
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7667178A Pending JPS552971A (en) | 1978-06-23 | 1978-06-23 | Film thickness measuring method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS552971A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003025532A1 (en) * | 2001-09-17 | 2003-03-27 | Matsushita Electric Industrial Co., Ltd. | Strain sensor and production method therefor |
WO2021124396A1 (en) * | 2019-12-16 | 2021-06-24 | 三菱電機ビルテクノサービス株式会社 | Elevator door, and maintenance component for elevator door |
-
1978
- 1978-06-23 JP JP7667178A patent/JPS552971A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003025532A1 (en) * | 2001-09-17 | 2003-03-27 | Matsushita Electric Industrial Co., Ltd. | Strain sensor and production method therefor |
US7043996B2 (en) | 2001-09-17 | 2006-05-16 | Matsushita Electric Industrial Co., Inc. | Strain sensor and production method therefor |
WO2021124396A1 (en) * | 2019-12-16 | 2021-06-24 | 三菱電機ビルテクノサービス株式会社 | Elevator door, and maintenance component for elevator door |
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