JPS5517163A - Exposure method of circumferential unnecessary parts in photoengraving process of lithography and others - Google Patents

Exposure method of circumferential unnecessary parts in photoengraving process of lithography and others

Info

Publication number
JPS5517163A
JPS5517163A JP9020178A JP9020178A JPS5517163A JP S5517163 A JPS5517163 A JP S5517163A JP 9020178 A JP9020178 A JP 9020178A JP 9020178 A JP9020178 A JP 9020178A JP S5517163 A JPS5517163 A JP S5517163A
Authority
JP
Japan
Prior art keywords
plate
opening
area
close contact
light source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9020178A
Other languages
Japanese (ja)
Inventor
Hidechika Yokoyama
Tatsumi Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP9020178A priority Critical patent/JPS5517163A/en
Publication of JPS5517163A publication Critical patent/JPS5517163A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Abstract

PURPOSE:To enable exposure to the unexposed photosensitive layer other than image-forming parts to be accomplished by so forming the opening of a projecting light source body having a light projecting range of area smaller than the total area of plate material flat that it is able to make close contact with the exposed surface of the plate. CONSTITUTION:This is the method of enabling exposure on the unnecessary parts other than the image forming section to be similarily accomplished in the printing-off and printing-in works ith positive type PS plates and deep-etch plates among lithographic plates, wherein the bottom of the frame body 1 of the projecting light source body has an opening 4 encircled by an edge piece 3 to permit close contact of the edge piece 3 and the exposed surface of the plate and a light emitting chamber 5 is constituted in the cavity continuous to the opening 4, in which a light source 2 is installed and the opening 4 is formed to an oblong shape and to an area much smaller than the area of the plate body having the exposed surface so that when the edge piece 3 is put in close contact with the exposure surface of the exposed plate the projection of light to areas other than the required area is obviated.
JP9020178A 1978-07-24 1978-07-24 Exposure method of circumferential unnecessary parts in photoengraving process of lithography and others Pending JPS5517163A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9020178A JPS5517163A (en) 1978-07-24 1978-07-24 Exposure method of circumferential unnecessary parts in photoengraving process of lithography and others

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9020178A JPS5517163A (en) 1978-07-24 1978-07-24 Exposure method of circumferential unnecessary parts in photoengraving process of lithography and others

Publications (1)

Publication Number Publication Date
JPS5517163A true JPS5517163A (en) 1980-02-06

Family

ID=13991865

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9020178A Pending JPS5517163A (en) 1978-07-24 1978-07-24 Exposure method of circumferential unnecessary parts in photoengraving process of lithography and others

Country Status (1)

Country Link
JP (1) JPS5517163A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59174842A (en) * 1983-03-24 1984-10-03 Fuji Photo Film Co Ltd Plate making method using positive type photosensitive lithographic plate
JP2006216663A (en) * 2005-02-02 2006-08-17 Disco Abrasive Syst Ltd Exposure device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59174842A (en) * 1983-03-24 1984-10-03 Fuji Photo Film Co Ltd Plate making method using positive type photosensitive lithographic plate
JP2006216663A (en) * 2005-02-02 2006-08-17 Disco Abrasive Syst Ltd Exposure device
JP4571870B2 (en) * 2005-02-02 2010-10-27 株式会社ディスコ Exposure equipment

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