JPS55166921A - Automatic mask alignment apparatus - Google Patents

Automatic mask alignment apparatus

Info

Publication number
JPS55166921A
JPS55166921A JP7465379A JP7465379A JPS55166921A JP S55166921 A JPS55166921 A JP S55166921A JP 7465379 A JP7465379 A JP 7465379A JP 7465379 A JP7465379 A JP 7465379A JP S55166921 A JPS55166921 A JP S55166921A
Authority
JP
Japan
Prior art keywords
mask
alignment
target
coarse
automatic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7465379A
Other languages
Japanese (ja)
Inventor
Susumu Komoriya
Hiroshi Maejima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP7465379A priority Critical patent/JPS55166921A/en
Publication of JPS55166921A publication Critical patent/JPS55166921A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70541—Tagging, i.e. hardware or software tagging of features or components, e.g. using tagging scripts or tagging identifier codes for identification of chips, shots or wafers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To make manual alignment unnecessary in automatic mask alignment process by a method wherein by function which enables addition of a mask target in a sight of a optical system of a mask alignment apparatus being added, coarse alignment is attained. CONSTITUTION:By a coded pattern 10 which is printed with a target pattern 3 mask target position and target spacing are informed, and by this input information a mask target 3 is aligned in automatic and coarse manner in a field of an objective lens 6. This read operation is performed by a photo sensor 11, and through activation of a coarse alignment part 18 by the read value, a mask position and distance along the optical shaft of the objective lens 6 are adjusted. Next fine alignment is performed by utilizing target patterns 3, 4 on a water and a mask. By this method manual alignment is made unnecessary even when a mask is changed, and alignment process followed by exposure process can be fully automated.
JP7465379A 1979-06-15 1979-06-15 Automatic mask alignment apparatus Pending JPS55166921A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7465379A JPS55166921A (en) 1979-06-15 1979-06-15 Automatic mask alignment apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7465379A JPS55166921A (en) 1979-06-15 1979-06-15 Automatic mask alignment apparatus

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP60030355A Division JPS60216547A (en) 1985-02-20 1985-02-20 Exposing method
JP60030356A Division JPS60216548A (en) 1985-02-20 1985-02-20 Lamellar article for exposure

Publications (1)

Publication Number Publication Date
JPS55166921A true JPS55166921A (en) 1980-12-26

Family

ID=13553396

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7465379A Pending JPS55166921A (en) 1979-06-15 1979-06-15 Automatic mask alignment apparatus

Country Status (1)

Country Link
JP (1) JPS55166921A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59155133A (en) * 1984-01-20 1984-09-04 Hitachi Ltd Mask handling device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59155133A (en) * 1984-01-20 1984-09-04 Hitachi Ltd Mask handling device
JPS6364050B2 (en) * 1984-01-20 1988-12-09

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