JPS56112731A - Mask correcting apparatus - Google Patents
Mask correcting apparatusInfo
- Publication number
- JPS56112731A JPS56112731A JP1564880A JP1564880A JPS56112731A JP S56112731 A JPS56112731 A JP S56112731A JP 1564880 A JP1564880 A JP 1564880A JP 1564880 A JP1564880 A JP 1564880A JP S56112731 A JPS56112731 A JP S56112731A
- Authority
- JP
- Japan
- Prior art keywords
- incorrect region
- mask
- stage
- laser light
- incorrect
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE:To precisely correct the mask by detecting the reference position of the mask having incorrect region and fixed to an X-Y stage with a pulse signal to move the stage, setting it at the reference position, irradiating laser light rays thereto, and removing the incorrect region. CONSTITUTION:The mask 21 having incorrect region 21a to be corrected for the mask pattern is secured to the X-Y stage 20, the stage is moved, and disposed directly under the objective lens 22. On the other hand, it is observed through an eyepiece lens 32 with the light from a transmission illumination light source 35, and the slit 26 is set at a value adapted for the shape of incorrect region. Then, the pulse signal is irradiated from the signal source 36 to the incorrect region, the reflected pulse is received by a receiver 37, the laser light rays are irradiated from the laser light source 25 in the state that the incorrect region is set at the focal position with respect to the laser light rays of the objective lens with the detected value, and the incorrect region is removed. Thus, the mask pattern can be corrected with high precision.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1564880A JPS56112731A (en) | 1980-02-12 | 1980-02-12 | Mask correcting apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1564880A JPS56112731A (en) | 1980-02-12 | 1980-02-12 | Mask correcting apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56112731A true JPS56112731A (en) | 1981-09-05 |
Family
ID=11894532
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1564880A Pending JPS56112731A (en) | 1980-02-12 | 1980-02-12 | Mask correcting apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56112731A (en) |
-
1980
- 1980-02-12 JP JP1564880A patent/JPS56112731A/en active Pending
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