JPS55164092A - Noncrystalline alloy-plated layer and its manufacture - Google Patents

Noncrystalline alloy-plated layer and its manufacture

Info

Publication number
JPS55164092A
JPS55164092A JP7248079A JP7248079A JPS55164092A JP S55164092 A JPS55164092 A JP S55164092A JP 7248079 A JP7248079 A JP 7248079A JP 7248079 A JP7248079 A JP 7248079A JP S55164092 A JPS55164092 A JP S55164092A
Authority
JP
Japan
Prior art keywords
acid
plated layer
noncrystalline alloy
plating
noncrystalline
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7248079A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6310235B2 (ko
Inventor
Yoshimi Makino
Akira Kamihira
Moriyasu Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP7248079A priority Critical patent/JPS55164092A/ja
Publication of JPS55164092A publication Critical patent/JPS55164092A/ja
Publication of JPS6310235B2 publication Critical patent/JPS6310235B2/ja
Granted legal-status Critical Current

Links

Classifications

    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00—Technologies related to metal processing
    • Y02P10/20—Recycling

Landscapes

  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Thin Magnetic Films (AREA)
JP7248079A 1979-06-08 1979-06-08 Noncrystalline alloy-plated layer and its manufacture Granted JPS55164092A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7248079A JPS55164092A (en) 1979-06-08 1979-06-08 Noncrystalline alloy-plated layer and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7248079A JPS55164092A (en) 1979-06-08 1979-06-08 Noncrystalline alloy-plated layer and its manufacture

Publications (2)

Publication Number Publication Date
JPS55164092A true JPS55164092A (en) 1980-12-20
JPS6310235B2 JPS6310235B2 (ko) 1988-03-04

Family

ID=13490517

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7248079A Granted JPS55164092A (en) 1979-06-08 1979-06-08 Noncrystalline alloy-plated layer and its manufacture

Country Status (1)

Country Link
JP (1) JPS55164092A (ko)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62147488U (ko) * 1986-03-10 1987-09-17
JPH01247590A (ja) * 1988-03-30 1989-10-03 Mitsubishi Rayon Co Ltd 非晶質合金
US5435903A (en) * 1989-10-12 1995-07-25 Mitsubishi Rayon Company, Ltd. Process for the electrodeposition of an amorphous cobalt-iron-phosphorus alloy
US5484494A (en) * 1992-05-14 1996-01-16 Mitsubishi Rayon Company, Inc. Amorphous alloy and method for its production
WO2001023645A1 (en) * 1999-09-30 2001-04-05 Research Institute Acreo Ab Method for electrodeposition of metallic multilayers
US7095586B2 (en) 2002-01-15 2006-08-22 Alps Electric Co., Ltd. Soft magnetic film having saturation magnetic flux density Bs of at least 2.0 T and magnetic head including the same
US7396445B2 (en) 2001-01-15 2008-07-08 Tdk Corporation Method of manufacturing a thin-film magnetic head using a soft magnetic film having high saturation magnetic flux density

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62147488U (ko) * 1986-03-10 1987-09-17
JPH0318156Y2 (ko) * 1986-03-10 1991-04-17
JPH01247590A (ja) * 1988-03-30 1989-10-03 Mitsubishi Rayon Co Ltd 非晶質合金
US5435903A (en) * 1989-10-12 1995-07-25 Mitsubishi Rayon Company, Ltd. Process for the electrodeposition of an amorphous cobalt-iron-phosphorus alloy
US5484494A (en) * 1992-05-14 1996-01-16 Mitsubishi Rayon Company, Inc. Amorphous alloy and method for its production
WO2001023645A1 (en) * 1999-09-30 2001-04-05 Research Institute Acreo Ab Method for electrodeposition of metallic multilayers
US7396445B2 (en) 2001-01-15 2008-07-08 Tdk Corporation Method of manufacturing a thin-film magnetic head using a soft magnetic film having high saturation magnetic flux density
US7095586B2 (en) 2002-01-15 2006-08-22 Alps Electric Co., Ltd. Soft magnetic film having saturation magnetic flux density Bs of at least 2.0 T and magnetic head including the same

Also Published As

Publication number Publication date
JPS6310235B2 (ko) 1988-03-04

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