JPS55164092A - Noncrystalline alloy-plated layer and its manufacture - Google Patents
Noncrystalline alloy-plated layer and its manufactureInfo
- Publication number
- JPS55164092A JPS55164092A JP7248079A JP7248079A JPS55164092A JP S55164092 A JPS55164092 A JP S55164092A JP 7248079 A JP7248079 A JP 7248079A JP 7248079 A JP7248079 A JP 7248079A JP S55164092 A JPS55164092 A JP S55164092A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- plated layer
- noncrystalline alloy
- plating
- noncrystalline
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Abstract
PURPOSE: To raise the magnetic characteristics by forming the noncrystalline alloy- plated layer containing a given ratio of Co and P as the main components.
CONSTITUTION: In the place of Fe-P noncrystalline alloy previously applied, a Co- P noncrystalline alloy-plated layer, containing 60W92atom% Co and 8W26atom% P as the main components, is obtained by an electric plating method using an acid plating bath consisting primarily of approx. 1/6W3mol/l of a divalent Co ion (e.g., cobalt sulfate, etc.) and approx. 0.03W0.3mol/l of hypophosphic acid and/or a hypophosphite (e.g., sodium hypophosphite, etc.). The conditions for plating includes pH1.2W2.2, a current density of 5W20A/dm2, and a bath temperature of 30W60°C, and also a stabilizer, e.g., L-ascorbic acid, etc., and a brightener, e.g., hydroquinolic acid, etc., are added to the plating system. Thus, a magnetostriction constant is made smaller and also magnetic permeability and coercive force are raised.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7248079A JPS55164092A (en) | 1979-06-08 | 1979-06-08 | Noncrystalline alloy-plated layer and its manufacture |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7248079A JPS55164092A (en) | 1979-06-08 | 1979-06-08 | Noncrystalline alloy-plated layer and its manufacture |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55164092A true JPS55164092A (en) | 1980-12-20 |
JPS6310235B2 JPS6310235B2 (en) | 1988-03-04 |
Family
ID=13490517
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7248079A Granted JPS55164092A (en) | 1979-06-08 | 1979-06-08 | Noncrystalline alloy-plated layer and its manufacture |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55164092A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62147488U (en) * | 1986-03-10 | 1987-09-17 | ||
JPH01247590A (en) * | 1988-03-30 | 1989-10-03 | Mitsubishi Rayon Co Ltd | Amorphous alloy |
US5435903A (en) * | 1989-10-12 | 1995-07-25 | Mitsubishi Rayon Company, Ltd. | Process for the electrodeposition of an amorphous cobalt-iron-phosphorus alloy |
US5484494A (en) * | 1992-05-14 | 1996-01-16 | Mitsubishi Rayon Company, Inc. | Amorphous alloy and method for its production |
WO2001023645A1 (en) * | 1999-09-30 | 2001-04-05 | Research Institute Acreo Ab | Method for electrodeposition of metallic multilayers |
US7095586B2 (en) | 2002-01-15 | 2006-08-22 | Alps Electric Co., Ltd. | Soft magnetic film having saturation magnetic flux density Bs of at least 2.0 T and magnetic head including the same |
US7396445B2 (en) | 2001-01-15 | 2008-07-08 | Tdk Corporation | Method of manufacturing a thin-film magnetic head using a soft magnetic film having high saturation magnetic flux density |
-
1979
- 1979-06-08 JP JP7248079A patent/JPS55164092A/en active Granted
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62147488U (en) * | 1986-03-10 | 1987-09-17 | ||
JPH0318156Y2 (en) * | 1986-03-10 | 1991-04-17 | ||
JPH01247590A (en) * | 1988-03-30 | 1989-10-03 | Mitsubishi Rayon Co Ltd | Amorphous alloy |
US5435903A (en) * | 1989-10-12 | 1995-07-25 | Mitsubishi Rayon Company, Ltd. | Process for the electrodeposition of an amorphous cobalt-iron-phosphorus alloy |
US5484494A (en) * | 1992-05-14 | 1996-01-16 | Mitsubishi Rayon Company, Inc. | Amorphous alloy and method for its production |
WO2001023645A1 (en) * | 1999-09-30 | 2001-04-05 | Research Institute Acreo Ab | Method for electrodeposition of metallic multilayers |
US7396445B2 (en) | 2001-01-15 | 2008-07-08 | Tdk Corporation | Method of manufacturing a thin-film magnetic head using a soft magnetic film having high saturation magnetic flux density |
US7095586B2 (en) | 2002-01-15 | 2006-08-22 | Alps Electric Co., Ltd. | Soft magnetic film having saturation magnetic flux density Bs of at least 2.0 T and magnetic head including the same |
Also Published As
Publication number | Publication date |
---|---|
JPS6310235B2 (en) | 1988-03-04 |
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