JPS55162756A - Preparation of cyclohexenedicarboxylic acid diamide - Google Patents
Preparation of cyclohexenedicarboxylic acid diamideInfo
- Publication number
- JPS55162756A JPS55162756A JP6977179A JP6977179A JPS55162756A JP S55162756 A JPS55162756 A JP S55162756A JP 6977179 A JP6977179 A JP 6977179A JP 6977179 A JP6977179 A JP 6977179A JP S55162756 A JPS55162756 A JP S55162756A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- tetrahydrophthalimide
- acid diamide
- compound
- halogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6977179A JPS55162756A (en) | 1979-06-04 | 1979-06-04 | Preparation of cyclohexenedicarboxylic acid diamide |
US06/152,844 US4380395A (en) | 1979-06-04 | 1980-05-23 | Reduction projection aligner system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6977179A JPS55162756A (en) | 1979-06-04 | 1979-06-04 | Preparation of cyclohexenedicarboxylic acid diamide |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55162756A true JPS55162756A (en) | 1980-12-18 |
Family
ID=13412379
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6977179A Pending JPS55162756A (en) | 1979-06-04 | 1979-06-04 | Preparation of cyclohexenedicarboxylic acid diamide |
Country Status (2)
Country | Link |
---|---|
US (1) | US4380395A (ja) |
JP (1) | JPS55162756A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01139556A (ja) * | 1987-11-25 | 1989-06-01 | Nippon Shokubai Kagaku Kogyo Co Ltd | 2.3−ナフタレンジカルボン酸ジアミド及びその製造方法 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57102017A (en) * | 1980-12-17 | 1982-06-24 | Hitachi Ltd | Pattern detector |
JPS5972134A (ja) * | 1982-10-18 | 1984-04-24 | Hitachi Ltd | パタ−ン検出装置 |
JPS5979527A (ja) * | 1982-10-29 | 1984-05-08 | Hitachi Ltd | パタ−ン検出装置 |
JPS6155710A (ja) * | 1984-08-27 | 1986-03-20 | Sharp Corp | アライメント方法 |
US4795261A (en) * | 1985-12-24 | 1989-01-03 | Hitachi, Ltd. | Reduction projection type aligner |
TWI400431B (zh) * | 2010-01-04 | 2013-07-01 | Asia Optical Co Inc | 測距裝置 |
CN105414957B (zh) * | 2015-12-03 | 2018-02-13 | 中国航空工业集团公司洛阳电光设备研究所 | 一种轴系部件同轴装配方法及同轴度检测方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3649121A (en) * | 1969-09-22 | 1972-03-14 | Lewis Cohen | Mass production photographic printing method |
JPS549900B2 (ja) * | 1972-10-13 | 1979-04-28 | ||
US3943359A (en) * | 1973-06-15 | 1976-03-09 | Hitachi, Ltd. | Apparatus for relatively positioning a plurality of objects by the use of a scanning optoelectric microscope |
DE2626363C2 (de) * | 1975-06-13 | 1983-09-15 | Hitachi, Ltd., Tokyo | Fotoelektrisches Meßmikroskop |
JPS5228347A (en) * | 1975-08-29 | 1977-03-03 | Nippon Kogaku Kk <Nikon> | Position detector unit |
JPS52109875A (en) * | 1976-02-25 | 1977-09-14 | Hitachi Ltd | Position matching system for mask and wafer and its unit |
JPS5369063A (en) * | 1976-12-01 | 1978-06-20 | Hitachi Ltd | Detector of position alignment patterns |
-
1979
- 1979-06-04 JP JP6977179A patent/JPS55162756A/ja active Pending
-
1980
- 1980-05-23 US US06/152,844 patent/US4380395A/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01139556A (ja) * | 1987-11-25 | 1989-06-01 | Nippon Shokubai Kagaku Kogyo Co Ltd | 2.3−ナフタレンジカルボン酸ジアミド及びその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
US4380395A (en) | 1983-04-19 |
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