JPS55160423A - Method and device for thin film growth - Google Patents
Method and device for thin film growthInfo
- Publication number
- JPS55160423A JPS55160423A JP6842879A JP6842879A JPS55160423A JP S55160423 A JPS55160423 A JP S55160423A JP 6842879 A JP6842879 A JP 6842879A JP 6842879 A JP6842879 A JP 6842879A JP S55160423 A JPS55160423 A JP S55160423A
- Authority
- JP
- Japan
- Prior art keywords
- room
- spectrometer
- beam source
- molecular beam
- mass spectrometer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/22—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials using physical deposition, e.g. vacuum deposition or sputtering
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6842879A JPS55160423A (en) | 1979-05-31 | 1979-05-31 | Method and device for thin film growth |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6842879A JPS55160423A (en) | 1979-05-31 | 1979-05-31 | Method and device for thin film growth |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55160423A true JPS55160423A (en) | 1980-12-13 |
| JPS626643B2 JPS626643B2 (enExample) | 1987-02-12 |
Family
ID=13373404
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6842879A Granted JPS55160423A (en) | 1979-05-31 | 1979-05-31 | Method and device for thin film growth |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55160423A (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59152296A (ja) * | 1983-02-17 | 1984-08-30 | Agency Of Ind Science & Technol | 分子線エピタキシヤル成長における分子線強度制御方法 |
| JPS59223293A (ja) * | 1983-05-31 | 1984-12-15 | Anelva Corp | 分子線エピタキシヤル成長装置 |
| JPS61291490A (ja) * | 1985-06-19 | 1986-12-22 | Hitachi Ltd | 容器もしくは容器内部材に付着した不要なヒ素の除去法 |
-
1979
- 1979-05-31 JP JP6842879A patent/JPS55160423A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59152296A (ja) * | 1983-02-17 | 1984-08-30 | Agency Of Ind Science & Technol | 分子線エピタキシヤル成長における分子線強度制御方法 |
| JPS59223293A (ja) * | 1983-05-31 | 1984-12-15 | Anelva Corp | 分子線エピタキシヤル成長装置 |
| JPS61291490A (ja) * | 1985-06-19 | 1986-12-22 | Hitachi Ltd | 容器もしくは容器内部材に付着した不要なヒ素の除去法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS626643B2 (enExample) | 1987-02-12 |
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