JPS55157230A - Pattern position detector - Google Patents
Pattern position detectorInfo
- Publication number
- JPS55157230A JPS55157230A JP6504779A JP6504779A JPS55157230A JP S55157230 A JPS55157230 A JP S55157230A JP 6504779 A JP6504779 A JP 6504779A JP 6504779 A JP6504779 A JP 6504779A JP S55157230 A JPS55157230 A JP S55157230A
- Authority
- JP
- Japan
- Prior art keywords
- plate
- slit
- scanning
- pattern
- position detector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6504779A JPS55157230A (en) | 1979-05-28 | 1979-05-28 | Pattern position detector |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6504779A JPS55157230A (en) | 1979-05-28 | 1979-05-28 | Pattern position detector |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55157230A true JPS55157230A (en) | 1980-12-06 |
JPS625333B2 JPS625333B2 (enrdf_load_stackoverflow) | 1987-02-04 |
Family
ID=13275649
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6504779A Granted JPS55157230A (en) | 1979-05-28 | 1979-05-28 | Pattern position detector |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55157230A (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57138134A (en) * | 1981-02-20 | 1982-08-26 | Nippon Kogaku Kk <Nikon> | Positioning device |
JPS59172724A (ja) * | 1983-03-22 | 1984-09-29 | Canon Inc | マーク検出装置 |
JPH05234845A (ja) * | 1991-05-08 | 1993-09-10 | Hitachi Ltd | 縮小投影露光装置 |
-
1979
- 1979-05-28 JP JP6504779A patent/JPS55157230A/ja active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57138134A (en) * | 1981-02-20 | 1982-08-26 | Nippon Kogaku Kk <Nikon> | Positioning device |
JPS59172724A (ja) * | 1983-03-22 | 1984-09-29 | Canon Inc | マーク検出装置 |
JPH05234845A (ja) * | 1991-05-08 | 1993-09-10 | Hitachi Ltd | 縮小投影露光装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS625333B2 (enrdf_load_stackoverflow) | 1987-02-04 |
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