JPS55155353A - Developer composition - Google Patents

Developer composition

Info

Publication number
JPS55155353A
JPS55155353A JP6222679A JP6222679A JPS55155353A JP S55155353 A JPS55155353 A JP S55155353A JP 6222679 A JP6222679 A JP 6222679A JP 6222679 A JP6222679 A JP 6222679A JP S55155353 A JPS55155353 A JP S55155353A
Authority
JP
Japan
Prior art keywords
xylene
butyl acetate
developer composition
recovered
developer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6222679A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0238942B2 (enrdf_load_stackoverflow
Inventor
Akira Yokota
Shingo Asaumi
Hisashi Nakane
Uichi Oota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP6222679A priority Critical patent/JPS55155353A/ja
Publication of JPS55155353A publication Critical patent/JPS55155353A/ja
Publication of JPH0238942B2 publication Critical patent/JPH0238942B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP6222679A 1979-05-22 1979-05-22 Developer composition Granted JPS55155353A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6222679A JPS55155353A (en) 1979-05-22 1979-05-22 Developer composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6222679A JPS55155353A (en) 1979-05-22 1979-05-22 Developer composition

Publications (2)

Publication Number Publication Date
JPS55155353A true JPS55155353A (en) 1980-12-03
JPH0238942B2 JPH0238942B2 (enrdf_load_stackoverflow) 1990-09-03

Family

ID=13194023

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6222679A Granted JPS55155353A (en) 1979-05-22 1979-05-22 Developer composition

Country Status (1)

Country Link
JP (1) JPS55155353A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56101148A (en) * 1980-01-16 1981-08-13 Toshiba Corp Photoresist developing method
JPS592043A (ja) * 1982-06-29 1984-01-07 Fujitsu Ltd フオトレジストの現像方法
JPS6043826A (ja) * 1983-08-19 1985-03-08 Rohm Co Ltd 半導体装置の製造方法
US6551749B1 (en) 1999-04-09 2003-04-22 Fujitsu Limited Developer and method for forming resist pattern and photomask produced by use thereof

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5359367A (en) * 1976-11-10 1978-05-29 Hitachi Ltd Formation of electron beam resist image
JPS53138676A (en) * 1977-05-06 1978-12-04 Allied Chem Method of developing photoresist

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5359367A (en) * 1976-11-10 1978-05-29 Hitachi Ltd Formation of electron beam resist image
JPS53138676A (en) * 1977-05-06 1978-12-04 Allied Chem Method of developing photoresist

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56101148A (en) * 1980-01-16 1981-08-13 Toshiba Corp Photoresist developing method
JPS592043A (ja) * 1982-06-29 1984-01-07 Fujitsu Ltd フオトレジストの現像方法
JPS6043826A (ja) * 1983-08-19 1985-03-08 Rohm Co Ltd 半導体装置の製造方法
US6551749B1 (en) 1999-04-09 2003-04-22 Fujitsu Limited Developer and method for forming resist pattern and photomask produced by use thereof

Also Published As

Publication number Publication date
JPH0238942B2 (enrdf_load_stackoverflow) 1990-09-03

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