JPS55152177A - Ion beam deposition equipment - Google Patents
Ion beam deposition equipmentInfo
- Publication number
- JPS55152177A JPS55152177A JP6110079A JP6110079A JPS55152177A JP S55152177 A JPS55152177 A JP S55152177A JP 6110079 A JP6110079 A JP 6110079A JP 6110079 A JP6110079 A JP 6110079A JP S55152177 A JPS55152177 A JP S55152177A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- deposited
- coating layer
- selector
- particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007737 ion beam deposition Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 5
- 239000011247 coating layer Substances 0.000 abstract 3
- 239000002245 particle Substances 0.000 abstract 3
- 239000002923 metal particle Substances 0.000 abstract 2
- 230000004888 barrier function Effects 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 238000010894 electron beam technology Methods 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 229910021645 metal ion Inorganic materials 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 238000001771 vacuum deposition Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6110079A JPS5920748B2 (ja) | 1979-05-17 | 1979-05-17 | イオン・ビ−ム堆積装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6110079A JPS5920748B2 (ja) | 1979-05-17 | 1979-05-17 | イオン・ビ−ム堆積装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55152177A true JPS55152177A (en) | 1980-11-27 |
| JPS5920748B2 JPS5920748B2 (ja) | 1984-05-15 |
Family
ID=13161320
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6110079A Expired JPS5920748B2 (ja) | 1979-05-17 | 1979-05-17 | イオン・ビ−ム堆積装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5920748B2 (ja) |
-
1979
- 1979-05-17 JP JP6110079A patent/JPS5920748B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5920748B2 (ja) | 1984-05-15 |
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