JPS55148770A - Spatter apparatus - Google Patents

Spatter apparatus

Info

Publication number
JPS55148770A
JPS55148770A JP4614480A JP4614480A JPS55148770A JP S55148770 A JPS55148770 A JP S55148770A JP 4614480 A JP4614480 A JP 4614480A JP 4614480 A JP4614480 A JP 4614480A JP S55148770 A JPS55148770 A JP S55148770A
Authority
JP
Japan
Prior art keywords
spatter apparatus
spatter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4614480A
Other languages
English (en)
Other versions
JPS593546B2 (ja
Inventor
Charles F Jun Morrison
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Vac Tec Systems Inc
Original Assignee
Vac Tec Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vac Tec Systems Inc filed Critical Vac Tec Systems Inc
Publication of JPS55148770A publication Critical patent/JPS55148770A/ja
Publication of JPS593546B2 publication Critical patent/JPS593546B2/ja
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
    • H01J37/3452—Magnet distribution
JP4614480A 1979-04-09 1980-04-08 スパツタ装置 Expired JPS593546B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US2843479A 1979-04-09 1979-04-09
US28434 1998-02-24

Publications (2)

Publication Number Publication Date
JPS55148770A true JPS55148770A (en) 1980-11-19
JPS593546B2 JPS593546B2 (ja) 1984-01-24

Family

ID=21843423

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4614480A Expired JPS593546B2 (ja) 1979-04-09 1980-04-08 スパツタ装置

Country Status (5)

Country Link
JP (1) JPS593546B2 (ja)
CA (1) CA1153733A (ja)
DE (1) DE3012935C2 (ja)
FR (1) FR2454178A1 (ja)
GB (1) GB2051877B (ja)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58130277A (ja) * 1982-01-27 1983-08-03 Clarion Co Ltd マグネトロンスパツタ装置
JPS5989769A (ja) * 1982-11-15 1984-05-24 Hitachi Ltd プレ−ナマグネトロン型スパツタ電極
JPS59140375A (ja) * 1983-01-26 1984-08-11 マテリアルズ・リサ−チ・コ−ポレイシヨン 反応スパッタリング装置およびマグネトロン電極装置
JPS61124567A (ja) * 1984-11-20 1986-06-12 Matsushita Electric Ind Co Ltd スパツタリング装置
JPS62153365U (ja) * 1987-02-12 1987-09-29
JPH0219462A (ja) * 1988-07-06 1990-01-23 Ube Ind Ltd マグネトロンスパッタリング方法及びその装置
JP2016041855A (ja) * 2011-04-26 2016-03-31 株式会社アルバック カソードユニット

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4457825A (en) * 1980-05-16 1984-07-03 Varian Associates, Inc. Sputter target for use in a sputter coating source
CH649578A5 (de) * 1981-03-27 1985-05-31 Ulvac Corp Hochgeschwindigkeits-kathoden-zerstaeubungsvorrichtung.
GB2096177B (en) * 1981-04-07 1985-07-17 Fournier Paul R Improved integrated sputtering apparatus and method
GB2110719B (en) * 1981-11-30 1985-10-30 Anelva Corp Sputtering apparatus
US4391697A (en) * 1982-08-16 1983-07-05 Vac-Tec Systems, Inc. High rate magnetron sputtering of high permeability materials
US4515675A (en) * 1983-07-06 1985-05-07 Leybold-Heraeus Gmbh Magnetron cathode for cathodic evaportion apparatus
DE3429988A1 (de) * 1983-12-05 1985-06-13 Leybold-Heraeus GmbH, 5000 Köln Magnetronkatode zum zerstaeuben ferromagnetischer targets
CH659484A5 (de) * 1984-04-19 1987-01-30 Balzers Hochvakuum Anordnung zur beschichtung von substraten mittels kathodenzerstaeubung.
US4657619A (en) * 1985-11-29 1987-04-14 Donnell Kevin P O Diverter magnet arrangement for plasma processing system
GB2209769A (en) * 1987-09-16 1989-05-24 Ion Tech Ltd Sputter coating

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3878085A (en) * 1973-07-05 1975-04-15 Sloan Technology Corp Cathode sputtering apparatus
US3956093A (en) * 1974-12-16 1976-05-11 Airco, Inc. Planar magnetron sputtering method and apparatus
CH611938A5 (ja) * 1976-05-19 1979-06-29 Battelle Memorial Institute
NL7607473A (nl) * 1976-07-07 1978-01-10 Philips Nv Verstuifinrichting en werkwijze voor het ver- stuiven met een dergelijke inrichting.
US4094761A (en) * 1977-07-25 1978-06-13 Motorola, Inc. Magnetion sputtering of ferromagnetic material

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58130277A (ja) * 1982-01-27 1983-08-03 Clarion Co Ltd マグネトロンスパツタ装置
JPS5989769A (ja) * 1982-11-15 1984-05-24 Hitachi Ltd プレ−ナマグネトロン型スパツタ電極
JPS59140375A (ja) * 1983-01-26 1984-08-11 マテリアルズ・リサ−チ・コ−ポレイシヨン 反応スパッタリング装置およびマグネトロン電極装置
JPS6330987B2 (ja) * 1983-01-26 1988-06-21 Materiaruzu Risaachi Corp
JPS61124567A (ja) * 1984-11-20 1986-06-12 Matsushita Electric Ind Co Ltd スパツタリング装置
JPS62153365U (ja) * 1987-02-12 1987-09-29
JPH0219462A (ja) * 1988-07-06 1990-01-23 Ube Ind Ltd マグネトロンスパッタリング方法及びその装置
JP2016041855A (ja) * 2011-04-26 2016-03-31 株式会社アルバック カソードユニット

Also Published As

Publication number Publication date
GB2051877A (en) 1981-01-21
DE3012935C2 (de) 1983-04-14
FR2454178B1 (ja) 1983-11-25
JPS593546B2 (ja) 1984-01-24
FR2454178A1 (fr) 1980-11-07
CA1153733A (en) 1983-09-13
GB2051877B (en) 1983-03-02
DE3012935A1 (de) 1980-10-23

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