JPS55146961A - Semiconductor memory device - Google Patents
Semiconductor memory deviceInfo
- Publication number
- JPS55146961A JPS55146961A JP5349279A JP5349279A JPS55146961A JP S55146961 A JPS55146961 A JP S55146961A JP 5349279 A JP5349279 A JP 5349279A JP 5349279 A JP5349279 A JP 5349279A JP S55146961 A JPS55146961 A JP S55146961A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- film
- region
- type
- sio2
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
Abstract
PURPOSE:To avoid the reduction of logical level or inversion of informations stored in a memory device, by constructing the memory device with an information charge storage region, bit wire and sense amplifier and making these regions entrap the carriers formed by an irradiation of gamma ray. CONSTITUTION:An n<+>-type layer is formed by an epitaxial growth method on a p- type Si substrate 10, and a p-type layer 12 is formed thereon. A thick SiO2 field film 13 is formed along the periphery of the layer 12 while the central area of the layer 12 surrounded by the field film 13 is covered with a thin gate SiO2 film 14. Then, a fixed voltage line 15 consisting of a low resistance poly-crystal Si is deposited between the surface of the film 13 and an intermediate portion of the layer 14. Only the surface of this line is changed into an SiO2 film 16. A poly-crystal Si layer 17 constituting a gate electrode or a word line is formed to extend over the SiO2 film 16 and the layer 14. A window is formed in the film 14 contacting the other film 13, for forming in the region 12 an n<+>-type region 18 which serves as a source region or a bit line. In this arrangement, a depletion region 19 and a depletion layer DP are formed in the layer 12, so that the carriers produced as a result or irradiation by gamma rat is entrapped by the layer 11.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5349279A JPS55146961A (en) | 1979-05-02 | 1979-05-02 | Semiconductor memory device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5349279A JPS55146961A (en) | 1979-05-02 | 1979-05-02 | Semiconductor memory device |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60099566A Division JPS60258956A (en) | 1985-05-13 | 1985-05-13 | Semiconductor memory device |
JP60099565A Division JPS60258955A (en) | 1985-05-13 | 1985-05-13 | Semiconductor memory device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55146961A true JPS55146961A (en) | 1980-11-15 |
Family
ID=12944328
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5349279A Pending JPS55146961A (en) | 1979-05-02 | 1979-05-02 | Semiconductor memory device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55146961A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55162258A (en) * | 1979-06-05 | 1980-12-17 | Fujitsu Ltd | Semiconductor memory device |
JPS5694768A (en) * | 1979-12-28 | 1981-07-31 | Fujitsu Ltd | Semiconductor memory device |
JPS5790973A (en) * | 1980-11-27 | 1982-06-05 | Nec Corp | Semiconductor base body |
JPS587860A (en) * | 1981-07-06 | 1983-01-17 | Hitachi Ltd | Semiconductor memory device |
JPS58207641A (en) * | 1982-05-28 | 1983-12-03 | Nec Corp | Substrate for semiconductor device |
JPS6188556A (en) * | 1984-10-08 | 1986-05-06 | Nec Corp | Semiconductor memory cell |
JPS6432670A (en) * | 1988-06-15 | 1989-02-02 | Hitachi Ltd | Semiconductor memory circuit device |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5279787A (en) * | 1975-12-26 | 1977-07-05 | Toshiba Corp | Integrated circuit device |
JPS538082A (en) * | 1976-07-10 | 1978-01-25 | Toshiba Corp | Production of semiconductor device |
JPS54127291A (en) * | 1978-03-27 | 1979-10-03 | Cho Lsi Gijutsu Kenkyu Kumiai | Mos semiconductor ic device |
-
1979
- 1979-05-02 JP JP5349279A patent/JPS55146961A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5279787A (en) * | 1975-12-26 | 1977-07-05 | Toshiba Corp | Integrated circuit device |
JPS538082A (en) * | 1976-07-10 | 1978-01-25 | Toshiba Corp | Production of semiconductor device |
JPS54127291A (en) * | 1978-03-27 | 1979-10-03 | Cho Lsi Gijutsu Kenkyu Kumiai | Mos semiconductor ic device |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55162258A (en) * | 1979-06-05 | 1980-12-17 | Fujitsu Ltd | Semiconductor memory device |
JPS5694768A (en) * | 1979-12-28 | 1981-07-31 | Fujitsu Ltd | Semiconductor memory device |
JPS5790973A (en) * | 1980-11-27 | 1982-06-05 | Nec Corp | Semiconductor base body |
JPS587860A (en) * | 1981-07-06 | 1983-01-17 | Hitachi Ltd | Semiconductor memory device |
JPS58207641A (en) * | 1982-05-28 | 1983-12-03 | Nec Corp | Substrate for semiconductor device |
JPS6188556A (en) * | 1984-10-08 | 1986-05-06 | Nec Corp | Semiconductor memory cell |
JPS6432670A (en) * | 1988-06-15 | 1989-02-02 | Hitachi Ltd | Semiconductor memory circuit device |
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