JPS55144243A - Photomask - Google Patents

Photomask

Info

Publication number
JPS55144243A
JPS55144243A JP5283079A JP5283079A JPS55144243A JP S55144243 A JPS55144243 A JP S55144243A JP 5283079 A JP5283079 A JP 5283079A JP 5283079 A JP5283079 A JP 5283079A JP S55144243 A JPS55144243 A JP S55144243A
Authority
JP
Japan
Prior art keywords
quartz glass
ultraviolet rays
mask substrate
substrate
fluorescence
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5283079A
Other languages
Japanese (ja)
Other versions
JPS6145824B2 (en
Inventor
Toshiro Kagami
Hideo Koide
Hirohiko Yaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coorstek KK
Original Assignee
Toshiba Ceramics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Ceramics Co Ltd filed Critical Toshiba Ceramics Co Ltd
Priority to JP5283079A priority Critical patent/JPS55144243A/en
Publication of JPS55144243A publication Critical patent/JPS55144243A/en
Publication of JPS6145824B2 publication Critical patent/JPS6145824B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Glass Compositions (AREA)

Abstract

PURPOSE:To obtain a photomask capable of transferring fine patterns over a long terms, even if exposure with far ultraviolet rays of high luminous intensity is repeated, by using quartz glass having specified fluorescence emitting characteristics as the mask substrate. CONSTITUTION:Quartz glass emitting fluorescence whose maximum value is in a wavelength region of 420nm or more on being irradiated with ultraviolet rays of 237.8nm is used as a mask substrate. This quartz glass substrate is formed by melt-working artificial rock crystal contg. little metal impurities, especially about 0.3ppm or less in total of Fe, Ti and V or heat treating an ordinary quartz glass plate of high fluorescent intensity at about 1,000-1,100 deg.C for about 10-100hr.
JP5283079A 1979-04-28 1979-04-28 Photomask Granted JPS55144243A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5283079A JPS55144243A (en) 1979-04-28 1979-04-28 Photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5283079A JPS55144243A (en) 1979-04-28 1979-04-28 Photomask

Publications (2)

Publication Number Publication Date
JPS55144243A true JPS55144243A (en) 1980-11-11
JPS6145824B2 JPS6145824B2 (en) 1986-10-09

Family

ID=12925754

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5283079A Granted JPS55144243A (en) 1979-04-28 1979-04-28 Photomask

Country Status (1)

Country Link
JP (1) JPS55144243A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5977438A (en) * 1982-10-25 1984-05-02 Mitsubishi Electric Corp Formation of gelatin pattern used for color separation filter
JPS61180216A (en) * 1984-12-19 1986-08-12 フュージョン・システムズ・コーポレーション Apparatus and method for preventing radiation induced degrading of optical element
EP1031877A1 (en) * 1997-11-11 2000-08-30 Nikon Corporation Photomask, aberration correcting plate, exposure device and method of producing microdevice

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11422194B2 (en) 2018-10-30 2022-08-23 Ennet Company Limited Battery diagnosis apparatus and battery diagnosis method based on current pulse method
KR20200117794A (en) * 2019-04-05 2020-10-14 주식회사 엘지화학 Apparatus and method for managing battery

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4886918A (en) * 1972-02-22 1973-11-16

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4886918A (en) * 1972-02-22 1973-11-16

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5977438A (en) * 1982-10-25 1984-05-02 Mitsubishi Electric Corp Formation of gelatin pattern used for color separation filter
JPS61180216A (en) * 1984-12-19 1986-08-12 フュージョン・システムズ・コーポレーション Apparatus and method for preventing radiation induced degrading of optical element
EP1031877A1 (en) * 1997-11-11 2000-08-30 Nikon Corporation Photomask, aberration correcting plate, exposure device and method of producing microdevice
EP1031877A4 (en) * 1997-11-11 2001-05-09 Nikon Corp Photomask, aberration correcting plate, exposure device and method of producing microdevice

Also Published As

Publication number Publication date
JPS6145824B2 (en) 1986-10-09

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