JPS55143035A - Manufacture of pattern - Google Patents

Manufacture of pattern

Info

Publication number
JPS55143035A
JPS55143035A JP5105279A JP5105279A JPS55143035A JP S55143035 A JPS55143035 A JP S55143035A JP 5105279 A JP5105279 A JP 5105279A JP 5105279 A JP5105279 A JP 5105279A JP S55143035 A JPS55143035 A JP S55143035A
Authority
JP
Japan
Prior art keywords
pattern
resin
theta
angle
eliminated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5105279A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0121617B2 (enrdf_load_stackoverflow
Inventor
Hiroshi Gokan
Sotaro Edokoro
Seiji Kousei
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP5105279A priority Critical patent/JPS55143035A/ja
Publication of JPS55143035A publication Critical patent/JPS55143035A/ja
Publication of JPH0121617B2 publication Critical patent/JPH0121617B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
JP5105279A 1979-04-24 1979-04-24 Manufacture of pattern Granted JPS55143035A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5105279A JPS55143035A (en) 1979-04-24 1979-04-24 Manufacture of pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5105279A JPS55143035A (en) 1979-04-24 1979-04-24 Manufacture of pattern

Publications (2)

Publication Number Publication Date
JPS55143035A true JPS55143035A (en) 1980-11-08
JPH0121617B2 JPH0121617B2 (enrdf_load_stackoverflow) 1989-04-21

Family

ID=12876025

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5105279A Granted JPS55143035A (en) 1979-04-24 1979-04-24 Manufacture of pattern

Country Status (1)

Country Link
JP (1) JPS55143035A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59114824A (ja) * 1982-12-21 1984-07-03 Agency Of Ind Science & Technol 半導体装置の平坦化方法
JPS61183931A (ja) * 1985-02-12 1986-08-16 Trio Kenwood Corp 絶縁膜表面の平坦化方法
JPS61289635A (ja) * 1985-06-17 1986-12-19 Nippon Telegr & Teleph Corp <Ntt> 表面平坦化方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5166778A (en) * 1974-10-25 1976-06-09 Hitachi Ltd Handotaisochino seizohoho
JPS5432985A (en) * 1977-08-19 1979-03-10 Mitsubishi Electric Corp Flattening method for substrate surface with protrusion

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5166778A (en) * 1974-10-25 1976-06-09 Hitachi Ltd Handotaisochino seizohoho
JPS5432985A (en) * 1977-08-19 1979-03-10 Mitsubishi Electric Corp Flattening method for substrate surface with protrusion

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59114824A (ja) * 1982-12-21 1984-07-03 Agency Of Ind Science & Technol 半導体装置の平坦化方法
JPS61183931A (ja) * 1985-02-12 1986-08-16 Trio Kenwood Corp 絶縁膜表面の平坦化方法
JPS61289635A (ja) * 1985-06-17 1986-12-19 Nippon Telegr & Teleph Corp <Ntt> 表面平坦化方法

Also Published As

Publication number Publication date
JPH0121617B2 (enrdf_load_stackoverflow) 1989-04-21

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