JPS55124119A - Manufacturing method of electrochromic thin film - Google Patents

Manufacturing method of electrochromic thin film

Info

Publication number
JPS55124119A
JPS55124119A JP3169979A JP3169979A JPS55124119A JP S55124119 A JPS55124119 A JP S55124119A JP 3169979 A JP3169979 A JP 3169979A JP 3169979 A JP3169979 A JP 3169979A JP S55124119 A JPS55124119 A JP S55124119A
Authority
JP
Japan
Prior art keywords
chamber
vapor deposition
vacuum
deposition chamber
electron gun
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3169979A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6335005B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Kenji Matsuhiro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP3169979A priority Critical patent/JPS55124119A/ja
Publication of JPS55124119A publication Critical patent/JPS55124119A/ja
Publication of JPS6335005B2 publication Critical patent/JPS6335005B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
JP3169979A 1979-03-20 1979-03-20 Manufacturing method of electrochromic thin film Granted JPS55124119A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3169979A JPS55124119A (en) 1979-03-20 1979-03-20 Manufacturing method of electrochromic thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3169979A JPS55124119A (en) 1979-03-20 1979-03-20 Manufacturing method of electrochromic thin film

Publications (2)

Publication Number Publication Date
JPS55124119A true JPS55124119A (en) 1980-09-25
JPS6335005B2 JPS6335005B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1988-07-13

Family

ID=12338314

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3169979A Granted JPS55124119A (en) 1979-03-20 1979-03-20 Manufacturing method of electrochromic thin film

Country Status (1)

Country Link
JP (1) JPS55124119A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Also Published As

Publication number Publication date
JPS6335005B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1988-07-13

Similar Documents

Publication Publication Date Title
Abe et al. The deposition rate of metallic thin films in the reactive sputtering process
US5439575A (en) Hybrid method for depositing semi-conductive materials
US5055319A (en) Controlled high rate deposition of metal oxide films
EP0740710B1 (en) Magnetron sputtering apparatus for compound thin films
Mattox Physical vapor deposition (PVD) processes
JPS5210869A (en) Thin film forming method
EP0269112A3 (en) Method of forming a thin crystalline metal film
JPS62284076A (ja) 薄膜形成方法および装置
JPS55124119A (en) Manufacturing method of electrochromic thin film
JPS5489983A (en) Device and method for vacuum deposition compound
US6039847A (en) Method of forming a highly pure thin film and apparatus therefor
JPS5315273A (en) Forming method for transparent thin film of oxide
JPS5772307A (en) Alloy film material for magneticstorage and manufacture of the same
JPS54149338A (en) Thin film forming method by sputtering
Grajewski et al. Oxygen contamination of metal films produced by vacuum deposition
Shah Effect of deposition conditions on cation composition during reactive magnetron sputtering of high-Tc superconductors
JPH01104763A (ja) 金属化合物薄膜の製造方法
JPH0641729A (ja) 蒸着用材料
JPH048506B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPH03253559A (ja) 酸化物薄膜製造装置
JPS62287617A (ja) 薄膜形成装置
JPS56130468A (en) Controlling method for composition of vapor deposited film
JPS55108725A (en) Method for manufacture of thin iron oxide film
JPS57123968A (en) Formation of zinc oxide film by plasma vapor phase method
JPS5983762A (ja) 真空蒸着装置の排気方法