JPS55122132A - Impurity measuring system by vacuum heating - Google Patents
Impurity measuring system by vacuum heatingInfo
- Publication number
- JPS55122132A JPS55122132A JP2996979A JP2996979A JPS55122132A JP S55122132 A JPS55122132 A JP S55122132A JP 2996979 A JP2996979 A JP 2996979A JP 2996979 A JP2996979 A JP 2996979A JP S55122132 A JPS55122132 A JP S55122132A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- closed
- valves
- measuring system
- pumps
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E30/00—Energy generation of nuclear origin
- Y02E30/30—Nuclear fission reactors
Landscapes
- Sampling And Sample Adjustment (AREA)
- Monitoring And Testing Of Nuclear Reactors (AREA)
Abstract
PURPOSE: To improve the measuring efficiency and prevent a worker from being exposed to radiant rays, by charging and recovering a sample without breaking vacuum in a furnace tube, whereby the time for measuring evaporable impurities in the sample can be shortened.
CONSTITUTION: A sample is introduced into a feed mechanism 12 from an inlet 11. The inlet 11 is then closed to open a valve 9 so that the sample in the feed mechanism 12 enters a sample receiving section 10. The valve 9 is then closed. The pressure in the measuring system as a whole is reduced by a pump 18. The measuring system is made highly vacuous by operating pumps 26, 27, 29, and a furnace tube 3 is subjected to vacuum burning by heating the same at a high temperature by a heater 4. Valves 30, 36 are closed and pumps 40, 42 are operated to conduct measurement of blank gas with a pressure gauge 38. The valves 30, 36 are then opened to discharge the gas collection section 37. The valves 30, 36 are closed to introduce the sample in the sample receiving section 10 into a sample holder 25 in a Mo cylindrical furnace 2. The sample is heated at a high vacuum and a high temperature. The impurities in the gasified sample are collected in the gas collection section 37 by pumps 40, 42 and subjected to measurement.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2996979A JPS55122132A (en) | 1979-03-16 | 1979-03-16 | Impurity measuring system by vacuum heating |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2996979A JPS55122132A (en) | 1979-03-16 | 1979-03-16 | Impurity measuring system by vacuum heating |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55122132A true JPS55122132A (en) | 1980-09-19 |
JPS6156768B2 JPS6156768B2 (en) | 1986-12-04 |
Family
ID=12290785
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2996979A Granted JPS55122132A (en) | 1979-03-16 | 1979-03-16 | Impurity measuring system by vacuum heating |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55122132A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0212037A (en) * | 1988-06-30 | 1990-01-17 | Power Reactor & Nuclear Fuel Dev Corp | Volatile component analyzer |
WO2009054117A1 (en) * | 2007-10-23 | 2009-04-30 | Kinotech Solar Energy Corporation | Apparatus and process for the production of silicon |
-
1979
- 1979-03-16 JP JP2996979A patent/JPS55122132A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0212037A (en) * | 1988-06-30 | 1990-01-17 | Power Reactor & Nuclear Fuel Dev Corp | Volatile component analyzer |
WO2009054117A1 (en) * | 2007-10-23 | 2009-04-30 | Kinotech Solar Energy Corporation | Apparatus and process for the production of silicon |
Also Published As
Publication number | Publication date |
---|---|
JPS6156768B2 (en) | 1986-12-04 |
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