JPS55121435A - Heat resistant photoresist composition and manufacture thereof - Google Patents

Heat resistant photoresist composition and manufacture thereof

Info

Publication number
JPS55121435A
JPS55121435A JP2940479A JP2940479A JPS55121435A JP S55121435 A JPS55121435 A JP S55121435A JP 2940479 A JP2940479 A JP 2940479A JP 2940479 A JP2940479 A JP 2940479A JP S55121435 A JPS55121435 A JP S55121435A
Authority
JP
Japan
Prior art keywords
meth
compound
photoresist composition
100pts
acrylic acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2940479A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6116970B2 (enrdf_load_stackoverflow
Inventor
Kaoru Omura
Takeo Kimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Priority to JP2940479A priority Critical patent/JPS55121435A/ja
Publication of JPS55121435A publication Critical patent/JPS55121435A/ja
Publication of JPS6116970B2 publication Critical patent/JPS6116970B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
JP2940479A 1979-03-15 1979-03-15 Heat resistant photoresist composition and manufacture thereof Granted JPS55121435A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2940479A JPS55121435A (en) 1979-03-15 1979-03-15 Heat resistant photoresist composition and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2940479A JPS55121435A (en) 1979-03-15 1979-03-15 Heat resistant photoresist composition and manufacture thereof

Publications (2)

Publication Number Publication Date
JPS55121435A true JPS55121435A (en) 1980-09-18
JPS6116970B2 JPS6116970B2 (enrdf_load_stackoverflow) 1986-05-02

Family

ID=12275192

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2940479A Granted JPS55121435A (en) 1979-03-15 1979-03-15 Heat resistant photoresist composition and manufacture thereof

Country Status (1)

Country Link
JP (1) JPS55121435A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0470661A (ja) * 1990-07-06 1992-03-05 Sumitomo Bakelite Co Ltd 感光性樹脂組成物
JPH0477741A (ja) * 1990-07-20 1992-03-11 Sumitomo Bakelite Co Ltd 感光性樹脂組成物
JPH04130323A (ja) * 1990-09-21 1992-05-01 Sumitomo Bakelite Co Ltd 感光性樹脂組成物
JPH11327135A (ja) * 1998-05-20 1999-11-26 Fujitsu Ltd 感光性耐熱樹脂組成物、その組成物を用いた耐熱絶縁膜のパターン形成方法、及びその方法により得られるパターン化耐熱絶縁膜
JP2018521191A (ja) * 2015-07-22 2018-08-02 サン ケミカル コーポレイション プリント回路基板用インク

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0470661A (ja) * 1990-07-06 1992-03-05 Sumitomo Bakelite Co Ltd 感光性樹脂組成物
JPH0477741A (ja) * 1990-07-20 1992-03-11 Sumitomo Bakelite Co Ltd 感光性樹脂組成物
JPH04130323A (ja) * 1990-09-21 1992-05-01 Sumitomo Bakelite Co Ltd 感光性樹脂組成物
JPH11327135A (ja) * 1998-05-20 1999-11-26 Fujitsu Ltd 感光性耐熱樹脂組成物、その組成物を用いた耐熱絶縁膜のパターン形成方法、及びその方法により得られるパターン化耐熱絶縁膜
JP2018521191A (ja) * 2015-07-22 2018-08-02 サン ケミカル コーポレイション プリント回路基板用インク

Also Published As

Publication number Publication date
JPS6116970B2 (enrdf_load_stackoverflow) 1986-05-02

Similar Documents

Publication Publication Date Title
JPS5647471A (en) Instantaneous adhesive composition
JPS54145794A (en) Heat-resistant photosensitive material
JPS5764734A (en) Photosensitive resin composition and photosensitive element
JPS54162729A (en) Coating composition
JPS55121435A (en) Heat resistant photoresist composition and manufacture thereof
JPS5213593A (en) Preparation of polyester-modified vinyl polymer for solvent type coati ng composition with high solid content
JPS559538A (en) Heat resistant photoresist composition
JPS52139199A (en) Novel epoxy resin compositions
JPS55137176A (en) Pressure-sensitive adhesive composition
JPS56115344A (en) Vinyl alcohol polymer composition
JPS5650941A (en) Covering resin composition
JPS5433584A (en) Preparation of polymer latex
JPS5313696A (en) Solventless and curable composition
JPS55121436A (en) Heat resistant photoresist composition and manufacture thereof
JPS5565278A (en) Pressure-sensitive adhesive composition
JPS5558275A (en) Pressure-sensitive adhesive composition
JPS5584307A (en) Preparation of curing composition
JPH01113417A (ja) 光硬化性樹脂組成物
JPS528043A (en) Adhesive
JPS5369229A (en) Curable coating compositions
JPS5516054A (en) Heat-resistant coating composition
JPS5534250A (en) Adhesive composition
JPS5670065A (en) Quickly curable coating compound for electrical element
JPS55153906A (en) Acrylic polarizing film
JPS5565211A (en) Coating resin composition curable with actinic irradiation