JPS55121436A - Heat resistant photoresist composition and manufacture thereof - Google Patents

Heat resistant photoresist composition and manufacture thereof

Info

Publication number
JPS55121436A
JPS55121436A JP2940579A JP2940579A JPS55121436A JP S55121436 A JPS55121436 A JP S55121436A JP 2940579 A JP2940579 A JP 2940579A JP 2940579 A JP2940579 A JP 2940579A JP S55121436 A JPS55121436 A JP S55121436A
Authority
JP
Japan
Prior art keywords
aromatic
photoresist composition
sensitizer
polymer
manufacture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2940579A
Other languages
Japanese (ja)
Other versions
JPS6116971B2 (en
Inventor
Kaoru Omura
Takeo Kimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Priority to JP2940579A priority Critical patent/JPS55121436A/en
Publication of JPS55121436A publication Critical patent/JPS55121436A/en
Publication of JPS6116971B2 publication Critical patent/JPS6116971B2/ja
Granted legal-status Critical Current

Links

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  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

PURPOSE: To excellently improve the insulating properties and heat resistance of a photoresist by using a specified polymer prepared by introducing cinnamate group into aromatic polyamidoimide and a sensitizer as principal components.
CONSTITUTION: Organic solvent-soluble aromatic polyamidoimide having bonds at the 1- and 3-positions of its aromatic rings is reacted with cinnamic acid chloride, glycidyl cinnamate, cinnamic alcohol or the like in the presence of an organic polar solvent such as N,N-dimethylacetoamide to obtain a polymer represented by the formula. 100pts.wt. of this polymer are blended with 0.01W20pts.wt. of a sensitizer such as an aromatic hydrocarbon or an aromatic amino compound, e.g. picramide or 2-chloro-4-nitroaniline. A solution of the resulting photoresist composition is coated onto a substrate with a roller or the like.
COPYRIGHT: (C)1980,JPO&Japio
JP2940579A 1979-03-15 1979-03-15 Heat resistant photoresist composition and manufacture thereof Granted JPS55121436A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2940579A JPS55121436A (en) 1979-03-15 1979-03-15 Heat resistant photoresist composition and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2940579A JPS55121436A (en) 1979-03-15 1979-03-15 Heat resistant photoresist composition and manufacture thereof

Publications (2)

Publication Number Publication Date
JPS55121436A true JPS55121436A (en) 1980-09-18
JPS6116971B2 JPS6116971B2 (en) 1986-05-02

Family

ID=12275217

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2940579A Granted JPS55121436A (en) 1979-03-15 1979-03-15 Heat resistant photoresist composition and manufacture thereof

Country Status (1)

Country Link
JP (1) JPS55121436A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0619757U (en) * 1992-05-19 1994-03-15 啓恵 門脇 Handbag

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0619757U (en) * 1992-05-19 1994-03-15 啓恵 門脇 Handbag

Also Published As

Publication number Publication date
JPS6116971B2 (en) 1986-05-02

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