JPS55121436A - Heat resistant photoresist composition and manufacture thereof - Google Patents
Heat resistant photoresist composition and manufacture thereofInfo
- Publication number
- JPS55121436A JPS55121436A JP2940579A JP2940579A JPS55121436A JP S55121436 A JPS55121436 A JP S55121436A JP 2940579 A JP2940579 A JP 2940579A JP 2940579 A JP2940579 A JP 2940579A JP S55121436 A JPS55121436 A JP S55121436A
- Authority
- JP
- Japan
- Prior art keywords
- aromatic
- photoresist composition
- sensitizer
- polymer
- manufacture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Polymerisation Methods In General (AREA)
Abstract
PURPOSE: To excellently improve the insulating properties and heat resistance of a photoresist by using a specified polymer prepared by introducing cinnamate group into aromatic polyamidoimide and a sensitizer as principal components.
CONSTITUTION: Organic solvent-soluble aromatic polyamidoimide having bonds at the 1- and 3-positions of its aromatic rings is reacted with cinnamic acid chloride, glycidyl cinnamate, cinnamic alcohol or the like in the presence of an organic polar solvent such as N,N-dimethylacetoamide to obtain a polymer represented by the formula. 100pts.wt. of this polymer are blended with 0.01W20pts.wt. of a sensitizer such as an aromatic hydrocarbon or an aromatic amino compound, e.g. picramide or 2-chloro-4-nitroaniline. A solution of the resulting photoresist composition is coated onto a substrate with a roller or the like.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2940579A JPS55121436A (en) | 1979-03-15 | 1979-03-15 | Heat resistant photoresist composition and manufacture thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2940579A JPS55121436A (en) | 1979-03-15 | 1979-03-15 | Heat resistant photoresist composition and manufacture thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55121436A true JPS55121436A (en) | 1980-09-18 |
JPS6116971B2 JPS6116971B2 (en) | 1986-05-02 |
Family
ID=12275217
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2940579A Granted JPS55121436A (en) | 1979-03-15 | 1979-03-15 | Heat resistant photoresist composition and manufacture thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55121436A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0619757U (en) * | 1992-05-19 | 1994-03-15 | 啓恵 門脇 | Handbag |
-
1979
- 1979-03-15 JP JP2940579A patent/JPS55121436A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0619757U (en) * | 1992-05-19 | 1994-03-15 | 啓恵 門脇 | Handbag |
Also Published As
Publication number | Publication date |
---|---|
JPS6116971B2 (en) | 1986-05-02 |
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