JPS55118671A - Transistor - Google Patents
TransistorInfo
- Publication number
- JPS55118671A JPS55118671A JP2530079A JP2530079A JPS55118671A JP S55118671 A JPS55118671 A JP S55118671A JP 2530079 A JP2530079 A JP 2530079A JP 2530079 A JP2530079 A JP 2530079A JP S55118671 A JPS55118671 A JP S55118671A
- Authority
- JP
- Japan
- Prior art keywords
- emitter
- region
- base
- increase
- conducting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000015556 catabolic process Effects 0.000 abstract 2
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
Abstract
PURPOSE:To increase the electrostatic breakdown withstand voltage between the emitter and the base of a transistor by providing deeper band-like emitter region making contact with the portion of the vicinity of a base electrode on the surface of the emitter and the base junction portion. CONSTITUTION:A second conducting base region 2 is formed in a first conducting collector region 1. A deeper diffused region 4 is formed than the other emitter region 3 in the vicinity of the base electrode 7 of the emitter and the base junction of the first conducting emitter region 3 in the base region 2. Thus, since the region 4 is deeper than the other emitter region 3, the portion facing oppositely with the base electrode of the emitter and the base junction becomes wide to increase the current path. Accordingly, it can increase the electrostatic breakdown withstand voltage between the emitter and the base at the transistor.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2530079A JPS55118671A (en) | 1979-03-05 | 1979-03-05 | Transistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2530079A JPS55118671A (en) | 1979-03-05 | 1979-03-05 | Transistor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55118671A true JPS55118671A (en) | 1980-09-11 |
Family
ID=12162160
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2530079A Pending JPS55118671A (en) | 1979-03-05 | 1979-03-05 | Transistor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55118671A (en) |
-
1979
- 1979-03-05 JP JP2530079A patent/JPS55118671A/en active Pending
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