JPS5511280A - One pair exposure image forming system and product useful therefor - Google Patents
One pair exposure image forming system and product useful thereforInfo
- Publication number
- JPS5511280A JPS5511280A JP5794079A JP5794079A JPS5511280A JP S5511280 A JPS5511280 A JP S5511280A JP 5794079 A JP5794079 A JP 5794079A JP 5794079 A JP5794079 A JP 5794079A JP S5511280 A JPS5511280 A JP S5511280A
- Authority
- JP
- Japan
- Prior art keywords
- image forming
- forming system
- exposure image
- product useful
- useful therefor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/055—Thermographic processes for producing printing formes, e.g. with a thermal print head
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
- G03F7/346—Imagewise removal by selective transfer, e.g. peeling away using photosensitive materials other than non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Thermal Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US90483978A | 1978-05-11 | 1978-05-11 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5511280A true JPS5511280A (en) | 1980-01-26 |
Family
ID=25419865
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5794079A Pending JPS5511280A (en) | 1978-05-11 | 1979-05-11 | One pair exposure image forming system and product useful therefor |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS5511280A (de) |
DE (1) | DE2919138A1 (de) |
GB (1) | GB2021276A (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016538591A (ja) * | 2013-10-30 | 2016-12-08 | ネーデルランドセ・オルガニサティ・フォール・トゥーヘパスト−ナトゥールウェテンスハッペライク・オンデルズーク・テーエヌオー | 電気回路パターンを備える基板、それを提供するための方法およびシステム |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4458003A (en) * | 1982-06-07 | 1984-07-03 | Esselte Pendaflex Corp. | Photosensitive materials for use in making dry transfers |
DE3924812A1 (de) * | 1989-07-27 | 1991-01-31 | Hoechst Ag | Loesemittelgemisch und beschichtungsloesung fuer die herstellung negativ arbeitender lichtempfindlicher aufzeichnungsmaterialien |
GB9214304D0 (en) * | 1992-07-06 | 1992-08-19 | Du Pont Uk | Improvements in or relating to image formation |
DE69206802T2 (de) * | 1992-09-30 | 1996-07-18 | Agfa Gevaert Nv | Wärmeempfindliches Aufzeichnungsmaterial zur Herstellung von Bildern oder driographischen Druckplatten |
DE69218951T2 (de) * | 1992-12-08 | 1997-11-06 | Agfa Gevaert Nv | Wärmeempfindliches Aufzeignungselement |
WO1996034767A1 (en) * | 1995-05-01 | 1996-11-07 | Polaroid Corporation | Composite ablation-transfer imaging medium for printing plate production |
-
1979
- 1979-05-11 DE DE19792919138 patent/DE2919138A1/de not_active Withdrawn
- 1979-05-11 GB GB7916386A patent/GB2021276A/en not_active Withdrawn
- 1979-05-11 JP JP5794079A patent/JPS5511280A/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016538591A (ja) * | 2013-10-30 | 2016-12-08 | ネーデルランドセ・オルガニサティ・フォール・トゥーヘパスト−ナトゥールウェテンスハッペライク・オンデルズーク・テーエヌオー | 電気回路パターンを備える基板、それを提供するための方法およびシステム |
US10349525B2 (en) | 2013-10-30 | 2019-07-09 | Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno | Substrate comprising an electrical circuit pattern, method and system for providing same |
Also Published As
Publication number | Publication date |
---|---|
GB2021276A (en) | 1979-11-28 |
DE2919138A1 (de) | 1979-11-15 |
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