JPS55103755A - Mos integrated circuit device - Google Patents
Mos integrated circuit deviceInfo
- Publication number
- JPS55103755A JPS55103755A JP1015579A JP1015579A JPS55103755A JP S55103755 A JPS55103755 A JP S55103755A JP 1015579 A JP1015579 A JP 1015579A JP 1015579 A JP1015579 A JP 1015579A JP S55103755 A JPS55103755 A JP S55103755A
- Authority
- JP
- Japan
- Prior art keywords
- mos
- variation
- integrated circuit
- circuit device
- short
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000009792 diffusion process Methods 0.000 abstract 2
- 230000001747 exhibiting effect Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
- H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Abstract
PURPOSE:To stabilize operational characteristics by using diffusion matching type MOS transistor for the circuits which are susceptible to characteristic variation due to the threshold voltage variation and using usual MOS transistor for other parts in a MOS integrated circuit device whose channel length is 2mum or less. CONSTITUTION:In the short 4 channel region whose channel length is 2mum or less, threshold voltage VT of the diffusion matching MOS transistor has a smaller variation compard with VT of the short channel MOS Tr, and further, VT of the neghboring DSA.MOS Tr has also a small variation. Since the variation of VT in the short channel MOS Tr is determined by the processing precision, the variation of VT in the neighbring short channel MOS Tr becomes large. Consequently, by using DSA. MOS Trs for circuits (F.F., etc.) which are susceptible to VT variation, an integrated circuit device exhibiting stable operational characteristics can be obtained.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1015579A JPS55103755A (en) | 1979-01-31 | 1979-01-31 | Mos integrated circuit device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1015579A JPS55103755A (en) | 1979-01-31 | 1979-01-31 | Mos integrated circuit device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55103755A true JPS55103755A (en) | 1980-08-08 |
Family
ID=11742378
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1015579A Pending JPS55103755A (en) | 1979-01-31 | 1979-01-31 | Mos integrated circuit device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55103755A (en) |
-
1979
- 1979-01-31 JP JP1015579A patent/JPS55103755A/en active Pending
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