JPS55102269A - Method of fabricating semiconductor device - Google Patents

Method of fabricating semiconductor device

Info

Publication number
JPS55102269A
JPS55102269A JP820179A JP820179A JPS55102269A JP S55102269 A JPS55102269 A JP S55102269A JP 820179 A JP820179 A JP 820179A JP 820179 A JP820179 A JP 820179A JP S55102269 A JPS55102269 A JP S55102269A
Authority
JP
Japan
Prior art keywords
layer
film
substrate
type
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP820179A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0212012B2 (enExample
Inventor
Toshihiro Sekikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, Agency of Industrial Science and Technology filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP820179A priority Critical patent/JPS55102269A/ja
Publication of JPS55102269A publication Critical patent/JPS55102269A/ja
Publication of JPH0212012B2 publication Critical patent/JPH0212012B2/ja
Granted legal-status Critical Current

Links

JP820179A 1979-01-29 1979-01-29 Method of fabricating semiconductor device Granted JPS55102269A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP820179A JPS55102269A (en) 1979-01-29 1979-01-29 Method of fabricating semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP820179A JPS55102269A (en) 1979-01-29 1979-01-29 Method of fabricating semiconductor device

Publications (2)

Publication Number Publication Date
JPS55102269A true JPS55102269A (en) 1980-08-05
JPH0212012B2 JPH0212012B2 (enExample) 1990-03-16

Family

ID=11686641

Family Applications (1)

Application Number Title Priority Date Filing Date
JP820179A Granted JPS55102269A (en) 1979-01-29 1979-01-29 Method of fabricating semiconductor device

Country Status (1)

Country Link
JP (1) JPS55102269A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01123474A (ja) * 1987-11-09 1989-05-16 Nec Corp 絶縁ゲート型半導体装置
JPH01128569A (ja) * 1987-11-13 1989-05-22 Nec Corp 電界効果トランジスタ

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS508484A (enExample) * 1973-05-21 1975-01-28
JPS52107777A (en) * 1976-03-08 1977-09-09 Nippon Telegr & Teleph Corp <Ntt> Production of semiconductor unit

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS508484A (enExample) * 1973-05-21 1975-01-28
JPS52107777A (en) * 1976-03-08 1977-09-09 Nippon Telegr & Teleph Corp <Ntt> Production of semiconductor unit

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01123474A (ja) * 1987-11-09 1989-05-16 Nec Corp 絶縁ゲート型半導体装置
JPH01128569A (ja) * 1987-11-13 1989-05-22 Nec Corp 電界効果トランジスタ

Also Published As

Publication number Publication date
JPH0212012B2 (enExample) 1990-03-16

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