JPS5494428A - Amorphous metal layer - Google Patents

Amorphous metal layer

Info

Publication number
JPS5494428A
JPS5494428A JP13463678A JP13463678A JPS5494428A JP S5494428 A JPS5494428 A JP S5494428A JP 13463678 A JP13463678 A JP 13463678A JP 13463678 A JP13463678 A JP 13463678A JP S5494428 A JPS5494428 A JP S5494428A
Authority
JP
Japan
Prior art keywords
metal layer
amorphous metal
amorphous
layer
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13463678A
Other languages
English (en)
Other versions
JPS6044381B2 (ja
Inventor
Jiyon Kuomo Jieroomu
Giyangurii Amitaba
Jiyon Koburisuka Robaato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS5494428A publication Critical patent/JPS5494428A/ja
Publication of JPS6044381B2 publication Critical patent/JPS6044381B2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C45/00—Amorphous alloys
    • C22C45/04—Amorphous alloys with nickel or cobalt as the major constituent
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/006—Thin film resistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
    • H01F10/13—Amorphous metallic alloys, e.g. glassy metals
    • H01F10/131—Amorphous metallic alloys, e.g. glassy metals containing iron or nickel
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31511—Of epoxy ether
    • Y10T428/31515—As intermediate layer
    • Y10T428/31522—Next to metal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Thin Magnetic Films (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
JP53134636A 1977-12-30 1978-11-02 アモルフアス金属膜を形成する方法 Expired JPS6044381B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US866115 1977-12-30
US05/866,115 US4231816A (en) 1977-12-30 1977-12-30 Amorphous metallic and nitrogen containing alloy films

Publications (2)

Publication Number Publication Date
JPS5494428A true JPS5494428A (en) 1979-07-26
JPS6044381B2 JPS6044381B2 (ja) 1985-10-03

Family

ID=25346935

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53134636A Expired JPS6044381B2 (ja) 1977-12-30 1978-11-02 アモルフアス金属膜を形成する方法

Country Status (4)

Country Link
US (1) US4231816A (ja)
EP (1) EP0002712B1 (ja)
JP (1) JPS6044381B2 (ja)
DE (1) DE2862036D1 (ja)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5827941A (ja) * 1981-08-11 1983-02-18 Hitachi Ltd 非晶質薄膜の製造方法
JPS60152651A (ja) * 1984-01-20 1985-08-10 Res Dev Corp Of Japan 窒素を含む非晶質合金およびその製造方法
JPS61108113A (ja) * 1984-10-31 1986-05-26 Nec Home Electronics Ltd 薄膜非晶質軟磁性材料構造体
JPS6289309A (ja) * 1985-10-16 1987-04-23 Sony Corp 軟磁性薄膜
JPS62210607A (ja) * 1986-03-12 1987-09-16 Matsushita Electric Ind Co Ltd 軟磁性合金膜及びその形成法
JPS63254708A (ja) * 1987-04-10 1988-10-21 Matsushita Electric Ind Co Ltd 窒素を含む軟磁性合金膜
JPS63312965A (ja) * 1987-06-16 1988-12-21 Meidensha Electric Mfg Co Ltd 高耐食性コ−テイング材
JPS6432607A (en) * 1987-04-23 1989-02-02 Matsushita Electric Ind Co Ltd Magnetic alloy film
JPH0517890A (ja) * 1991-07-10 1993-01-26 Limes:Kk 電解電極材及びその製造方法
JPH0620835A (ja) * 1991-11-28 1994-01-28 Amorphous Denshi Device Kenkyusho:Kk 非晶質磁性薄膜
US5481422A (en) * 1992-07-24 1996-01-02 Matsushita Electric Industrial Co., Ltd. Magnetic head with metallic magnetic film and protective film means
CN107663620A (zh) * 2017-09-11 2018-02-06 北京工业大学 一种用于制备金属基隔热涂层的复合材料

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56136948A (en) * 1980-03-28 1981-10-26 Hitachi Ltd Amorphous alloy for magnetic head core
JPS5719361A (en) * 1980-07-11 1982-02-01 Hitachi Ltd Amorphous alloy for core of magnetic head and magnetic head for video using it
JPS57149706A (en) * 1981-03-12 1982-09-16 Tdk Corp Magnetic recording medium
US4834816A (en) * 1981-08-21 1989-05-30 Allied-Signal Inc. Metallic glasses having a combination of high permeability, low coercivity, low ac core loss, low exciting power and high thermal stability
FR2512070A1 (fr) * 1981-09-03 1983-03-04 Commissariat Energie Atomique Couche de chrome de haute durete, capable de resister a la fois a l'usure, a la deformation, a la fatigue des surfaces et a la corrosion
US4645715A (en) * 1981-09-23 1987-02-24 Energy Conversion Devices, Inc. Coating composition and method
JPS58190815A (ja) * 1982-04-30 1983-11-07 Futaba Corp 遷移元素けい化物非晶質膜
US4450206A (en) * 1982-05-27 1984-05-22 Allegheny Ludlum Steel Corporation Amorphous metals and articles made thereof
DE3442009A1 (de) * 1983-11-18 1985-06-05 Nippon Steel Corp., Tokio/Tokyo Amorphes legiertes band mit grosser dicke und verfahren zu dessen herstellung
JPS60220913A (ja) * 1984-04-18 1985-11-05 Sony Corp 磁性薄膜
JPS6169931A (ja) * 1984-09-14 1986-04-10 Univ Osaka 化学反応による金属間化合物のアモルフアス化方法
JPS6169932A (ja) * 1984-09-14 1986-04-10 Univ Osaka 格子欠陥を用いた化学反応による金属間化合物のアモルフアス化促進方法
GB2167448B (en) * 1984-11-02 1988-10-19 Hitachi Ltd Perpendicular magnetic recording medium
US4663193A (en) * 1984-12-26 1987-05-05 Hitachi Metals, Ltd. Process for manufacturing magnetic recording medium
US4797527A (en) * 1985-02-06 1989-01-10 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Electrode for electric discharge machining and method for producing the same
JPS62208412A (ja) * 1986-03-07 1987-09-12 Hitachi Ltd 磁気記録媒体およびその製造方法
DE3707522A1 (de) * 1986-03-12 1987-09-24 Matsushita Electric Ind Co Ltd Magnetischer nitridfilm
US4904543A (en) * 1987-04-23 1990-02-27 Matsushita Electric Industrial Co., Ltd. Compositionally modulated, nitrided alloy films and method for making the same
JPH0827927B2 (ja) * 1987-07-09 1996-03-21 富士通株式会社 磁気記録媒体
US4863810A (en) * 1987-09-21 1989-09-05 Universal Energy Systems, Inc. Corrosion resistant amorphous metallic coatings
FR2622337B1 (fr) * 1987-10-27 1995-06-16 Thomson Csf Tete d'enregistrement/lecture video, procede de realisation et appareil mettant en oeuvre ce procede
US4939041A (en) * 1989-07-11 1990-07-03 The United States Of America As Represented By The Secretary Of The Navy Metal film coatings on amorphous metallic alloys
EP0422760A1 (en) * 1989-10-12 1991-04-17 Mitsubishi Rayon Co., Ltd Amorphous alloy and process for preparation thereof
EP0442760B1 (en) * 1990-02-16 1994-04-20 Matsushita Electric Industrial Co., Ltd. Soft magnetic alloy films and magnetic heads using the same
US5439754A (en) * 1990-07-05 1995-08-08 Kabushiki Kaisha Toshiba Ferromagnetic film, method of manufacturing the same, and magnetic head
JP2789806B2 (ja) * 1990-09-28 1998-08-27 松下電器産業株式会社 軟磁性窒化合金膜の作製方法
US5407548A (en) * 1990-10-26 1995-04-18 Leybold Aktiengesellschaft Method for coating a substrate of low resistance to corrosion
DE4034034A1 (de) * 1990-10-26 1992-05-14 Leybold Ag Verfahren zum beschichten eines wenig korrosionsbestaendigen substrats
US5226975A (en) * 1991-03-20 1993-07-13 Cummins Engine Company, Inc. Plasma nitride chromium plated coating method
US5232566A (en) * 1991-05-14 1993-08-03 International Business Machines Corporation Underlayer doping in thin film magnetic recording media
JP2677721B2 (ja) * 1991-05-15 1997-11-17 功二 橋本 高耐食アモルファス合金
JP2780588B2 (ja) * 1993-01-14 1998-07-30 松下電器産業株式会社 積層型磁気ヘッドコア
US6416880B1 (en) 1993-12-09 2002-07-09 Seagate Technology, Llc Amorphous permalloy films and method of preparing the same
US6706156B1 (en) * 1996-09-06 2004-03-16 Seagate Technology Llc Method of making an improved MR sensor
JP4142753B2 (ja) 1996-12-26 2008-09-03 株式会社東芝 スパッタターゲット、スパッタ装置、半導体装置およびその製造方法
GB2353293A (en) * 1999-08-18 2001-02-21 Rtc Systems Ltd FeXN deposition process based on helicon sputtering
US6623566B1 (en) * 2001-07-30 2003-09-23 The United States Of America As Represented By The Secretary Of The Air Force Method of selection of alloy compositions for bulk metallic glasses
US9103022B2 (en) * 2007-10-01 2015-08-11 Southwest Research Institute Amorphous aluminum alloy coatings
JP5270647B2 (ja) * 2010-12-06 2013-08-21 信越化学工業株式会社 スパッタリング成膜用珪素ターゲットおよび珪素含有薄膜の成膜方法
CN105324512A (zh) * 2013-07-12 2016-02-10 惠普发展公司，有限责任合伙企业 非晶薄金属膜
US10177310B2 (en) 2014-07-30 2019-01-08 Hewlett Packard Enterprise Development Lp Amorphous metal alloy electrodes in non-volatile device applications

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5112306A (en) * 1974-07-20 1976-01-30 Nippon Steel Corp Hishoshitsugokin

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL266566A (ja) * 1960-06-30
FR1299153A (fr) * 1961-06-27 1962-07-20 Sperry Rand Corp Procédé de fabrication de pellicules magnétiques
GB1023150A (en) * 1962-09-18 1966-03-23 Gevaert Photo Prod Nv Magnetic signal carrier
US3427154A (en) * 1964-09-11 1969-02-11 Ibm Amorphous alloys and process therefor
JPS4942468B2 (ja) * 1971-11-04 1974-11-15
US3965463A (en) * 1972-08-29 1976-06-22 International Business Machines Corporation Apparatus using amorphous magnetic compositions
US3856513A (en) * 1972-12-26 1974-12-24 Allied Chem Novel amorphous metals and amorphous metal articles
JPS5812728B2 (ja) * 1974-12-10 1983-03-10 富士写真フイルム株式会社 ジキキロクバイタイノ セイホウ
US4038073A (en) * 1976-03-01 1977-07-26 Allied Chemical Corporation Near-zero magnetostrictive glassy metal alloys with high saturation induction
US4030892A (en) * 1976-03-02 1977-06-21 Allied Chemical Corporation Flexible electromagnetic shield comprising interlaced glassy alloy filaments

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5112306A (en) * 1974-07-20 1976-01-30 Nippon Steel Corp Hishoshitsugokin

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5827941A (ja) * 1981-08-11 1983-02-18 Hitachi Ltd 非晶質薄膜の製造方法
JPS60152651A (ja) * 1984-01-20 1985-08-10 Res Dev Corp Of Japan 窒素を含む非晶質合金およびその製造方法
JPH052736B2 (ja) * 1984-01-20 1993-01-13 Shingijutsu Jigyodan
JPS61108113A (ja) * 1984-10-31 1986-05-26 Nec Home Electronics Ltd 薄膜非晶質軟磁性材料構造体
JPS6289309A (ja) * 1985-10-16 1987-04-23 Sony Corp 軟磁性薄膜
JPH0573242B2 (ja) * 1986-03-12 1993-10-14 Matsushita Electric Ind Co Ltd
JPS62210607A (ja) * 1986-03-12 1987-09-16 Matsushita Electric Ind Co Ltd 軟磁性合金膜及びその形成法
JPS63254708A (ja) * 1987-04-10 1988-10-21 Matsushita Electric Ind Co Ltd 窒素を含む軟磁性合金膜
JPS6432607A (en) * 1987-04-23 1989-02-02 Matsushita Electric Ind Co Ltd Magnetic alloy film
JPS63312965A (ja) * 1987-06-16 1988-12-21 Meidensha Electric Mfg Co Ltd 高耐食性コ−テイング材
JPH0517890A (ja) * 1991-07-10 1993-01-26 Limes:Kk 電解電極材及びその製造方法
JPH0620835A (ja) * 1991-11-28 1994-01-28 Amorphous Denshi Device Kenkyusho:Kk 非晶質磁性薄膜
JPH07114165B2 (ja) * 1991-11-28 1995-12-06 株式会社アモルファス・電子デバイス研究所 非晶質磁性薄膜
US5481422A (en) * 1992-07-24 1996-01-02 Matsushita Electric Industrial Co., Ltd. Magnetic head with metallic magnetic film and protective film means
CN107663620A (zh) * 2017-09-11 2018-02-06 北京工业大学 一种用于制备金属基隔热涂层的复合材料

Also Published As

Publication number Publication date
EP0002712B1 (de) 1982-09-15
DE2862036D1 (de) 1982-11-04
EP0002712A2 (de) 1979-07-11
EP0002712A3 (en) 1979-07-25
US4231816A (en) 1980-11-04
JPS6044381B2 (ja) 1985-10-03

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