JPS549176A - Sputtering method for forming unform film and evaporation film - Google Patents
Sputtering method for forming unform film and evaporation filmInfo
- Publication number
- JPS549176A JPS549176A JP7387677A JP7387677A JPS549176A JP S549176 A JPS549176 A JP S549176A JP 7387677 A JP7387677 A JP 7387677A JP 7387677 A JP7387677 A JP 7387677A JP S549176 A JPS549176 A JP S549176A
- Authority
- JP
- Japan
- Prior art keywords
- film
- unform
- forming
- sputtering method
- evaporation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To provide a sound evaporation film uniform in the thickness and quality with the substrate so arranged than nay point on the substrate can be sputtered with the target within the range of the same phase in the local magnetic field thereon.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7387677A JPS549176A (en) | 1977-06-23 | 1977-06-23 | Sputtering method for forming unform film and evaporation film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7387677A JPS549176A (en) | 1977-06-23 | 1977-06-23 | Sputtering method for forming unform film and evaporation film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS549176A true JPS549176A (en) | 1979-01-23 |
JPS629669B2 JPS629669B2 (en) | 1987-03-02 |
Family
ID=13530825
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7387677A Granted JPS549176A (en) | 1977-06-23 | 1977-06-23 | Sputtering method for forming unform film and evaporation film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS549176A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60227437A (en) * | 1983-09-28 | 1985-11-12 | Yokogawa Hewlett Packard Ltd | Interface for treating integrated circuit |
US6036824A (en) * | 1985-11-12 | 2000-03-14 | Magnetic Media Development Llc | Magnetic recording disk sputtering process and apparatus |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5186083A (en) * | 1974-12-16 | 1976-07-28 | Airco Inc | |
JPS5295581A (en) * | 1976-02-09 | 1977-08-11 | Anelva Corp | Sputiering apparatus |
JPS537586A (en) * | 1976-02-19 | 1978-01-24 | Sloan Technology Corp | Cathodic spattering apparatus |
-
1977
- 1977-06-23 JP JP7387677A patent/JPS549176A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5186083A (en) * | 1974-12-16 | 1976-07-28 | Airco Inc | |
JPS5295581A (en) * | 1976-02-09 | 1977-08-11 | Anelva Corp | Sputiering apparatus |
JPS537586A (en) * | 1976-02-19 | 1978-01-24 | Sloan Technology Corp | Cathodic spattering apparatus |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60227437A (en) * | 1983-09-28 | 1985-11-12 | Yokogawa Hewlett Packard Ltd | Interface for treating integrated circuit |
JPH0566733B2 (en) * | 1983-09-28 | 1993-09-22 | Hewlett Packard Co | |
US6036824A (en) * | 1985-11-12 | 2000-03-14 | Magnetic Media Development Llc | Magnetic recording disk sputtering process and apparatus |
Also Published As
Publication number | Publication date |
---|---|
JPS629669B2 (en) | 1987-03-02 |
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