JPS5473574A - Transfer mask and production of the same - Google Patents
Transfer mask and production of the sameInfo
- Publication number
- JPS5473574A JPS5473574A JP14122177A JP14122177A JPS5473574A JP S5473574 A JPS5473574 A JP S5473574A JP 14122177 A JP14122177 A JP 14122177A JP 14122177 A JP14122177 A JP 14122177A JP S5473574 A JPS5473574 A JP S5473574A
- Authority
- JP
- Japan
- Prior art keywords
- film
- composite films
- reinforced
- holes
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To make a transfer mask by forming a non-transmittable film with the composite films of a resin improved and reinforced through ion implantation and a metal and forming through-holes therein.
CONSTITUTION: A positive type resist film is coated n a glass substrate and is dipped in water. When it is scooped up with a backing 201 made of Si and is baked to tighten, then the high polymer resin film becomes tense. Next, X-rays or electron beams are radiated and are developed. For example, if the film 202 is made of polymethyl methacrylate, the radiated portions dissolve well in a solvent to produce through-holes, which become ideal transmission regions. When a Pt film 203 is evaporated about 1000 to 7000 Å on the non-transmission regions from the backing side, then the firm composite films are formed. When Ar, B, P are implanted more than 3 × 1014 cm-2 at above 100 kev from above after this, the film 204 is improved and reinforced to evenly shrink, thus the strength of the composite films is also intensified. In this way, the mask with nothing in the light transmission parts is formed.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14122177A JPS5473574A (en) | 1977-11-24 | 1977-11-24 | Transfer mask and production of the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14122177A JPS5473574A (en) | 1977-11-24 | 1977-11-24 | Transfer mask and production of the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5473574A true JPS5473574A (en) | 1979-06-12 |
Family
ID=15286934
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14122177A Pending JPS5473574A (en) | 1977-11-24 | 1977-11-24 | Transfer mask and production of the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5473574A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5683941A (en) * | 1979-11-13 | 1981-07-08 | Perkin Elmer Corp | Method of forming arbitrary stationary thin film for manufacturing lithographic mask |
| JPS572524A (en) * | 1980-05-07 | 1982-01-07 | Perkin Elmer Corp | Method of manufacturing mask substrate used in x-ray lithography |
| JPS59184526A (en) * | 1983-04-05 | 1984-10-19 | Agency Of Ind Science & Technol | Formation of pattern |
| JPS6132426A (en) * | 1984-07-16 | 1986-02-15 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | Method of reversing transparent mask |
-
1977
- 1977-11-24 JP JP14122177A patent/JPS5473574A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5683941A (en) * | 1979-11-13 | 1981-07-08 | Perkin Elmer Corp | Method of forming arbitrary stationary thin film for manufacturing lithographic mask |
| JPH0142133B2 (en) * | 1979-11-13 | 1989-09-11 | Perkin Elmer Corp | |
| JPS572524A (en) * | 1980-05-07 | 1982-01-07 | Perkin Elmer Corp | Method of manufacturing mask substrate used in x-ray lithography |
| JPS59184526A (en) * | 1983-04-05 | 1984-10-19 | Agency Of Ind Science & Technol | Formation of pattern |
| JPS6132426A (en) * | 1984-07-16 | 1986-02-15 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | Method of reversing transparent mask |
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