JPS5461531A - Thermal development of electron beam resist - Google Patents

Thermal development of electron beam resist

Info

Publication number
JPS5461531A
JPS5461531A JP12797077A JP12797077A JPS5461531A JP S5461531 A JPS5461531 A JP S5461531A JP 12797077 A JP12797077 A JP 12797077A JP 12797077 A JP12797077 A JP 12797077A JP S5461531 A JPS5461531 A JP S5461531A
Authority
JP
Japan
Prior art keywords
electron beam
stands
poly
substrate
irradiated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12797077A
Other languages
Japanese (ja)
Other versions
JPS5929853B2 (en
Inventor
Takateru Asano
Tsutomu Tsujimura
Hideo Kuniyoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Yakuhin Kogyo KK
Victor Company of Japan Ltd
Panasonic Holdings Corp
Original Assignee
Fuji Yakuhin Kogyo KK
Victor Company of Japan Ltd
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Yakuhin Kogyo KK, Victor Company of Japan Ltd, Matsushita Electric Industrial Co Ltd filed Critical Fuji Yakuhin Kogyo KK
Priority to JP52127970A priority Critical patent/JPS5929853B2/en
Publication of JPS5461531A publication Critical patent/JPS5461531A/en
Publication of JPS5929853B2 publication Critical patent/JPS5929853B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Photoreceptors In Electrophotography (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To sufficiently satisfy the sensitivity and resolution by heating a substrate in a constant temperature bath after a resist composed mainly of poly-α-cyanoacrylate with electron beams.
CONSTITUTION: An electron beam resist, whcih is composed mainly of poly-α- cyanoacrylate of Formula (wherein: X stands for cyano or carbamyl; R stands for a lower class alkyl; and n stands for a positive integer), poly-α-carbamylacrylate, or their copolymer, is formed on a substrate in a thickness of 0.5 to 1.5 microns and is prebaked at a low temperature. After having been irradiated with an electron beam, the substrate is heated in a constant temperature bath at 140 to 180°C for 5 to 60 minutes in accordance with the depth of the irradiated portion after development. The irradiated region is diffused by the heat treatment to leave a non-irradiated portion thereby to form a pattern
COPYRIGHT: (C)1979,JPO&Japio
JP52127970A 1977-10-25 1977-10-25 Heat development method for electron beam resist Expired JPS5929853B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP52127970A JPS5929853B2 (en) 1977-10-25 1977-10-25 Heat development method for electron beam resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52127970A JPS5929853B2 (en) 1977-10-25 1977-10-25 Heat development method for electron beam resist

Publications (2)

Publication Number Publication Date
JPS5461531A true JPS5461531A (en) 1979-05-17
JPS5929853B2 JPS5929853B2 (en) 1984-07-24

Family

ID=14973181

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52127970A Expired JPS5929853B2 (en) 1977-10-25 1977-10-25 Heat development method for electron beam resist

Country Status (1)

Country Link
JP (1) JPS5929853B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS585735A (en) * 1981-06-01 1983-01-13 Daikin Ind Ltd Manufacture of patterned resist film on substrate
JPS6435549A (en) * 1987-07-31 1989-02-06 Matsushita Electronics Corp Resist pattern forming method
WO2007029810A1 (en) * 2005-09-09 2007-03-15 Tokyo University Of Science Educational Foundation Administrative Organization Process for producing 3-dimensional mold, process for producing microfabrication product, process for producing micropattern molding, 3-dimensional mold, microfabrication product, micropattern molding and optical device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS585735A (en) * 1981-06-01 1983-01-13 Daikin Ind Ltd Manufacture of patterned resist film on substrate
JPH0222371B2 (en) * 1981-06-01 1990-05-18 Daikin Ind Ltd
JPS6435549A (en) * 1987-07-31 1989-02-06 Matsushita Electronics Corp Resist pattern forming method
WO2007029810A1 (en) * 2005-09-09 2007-03-15 Tokyo University Of Science Educational Foundation Administrative Organization Process for producing 3-dimensional mold, process for producing microfabrication product, process for producing micropattern molding, 3-dimensional mold, microfabrication product, micropattern molding and optical device

Also Published As

Publication number Publication date
JPS5929853B2 (en) 1984-07-24

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