JPS5461531A - Thermal development of electron beam resist - Google Patents
Thermal development of electron beam resistInfo
- Publication number
- JPS5461531A JPS5461531A JP12797077A JP12797077A JPS5461531A JP S5461531 A JPS5461531 A JP S5461531A JP 12797077 A JP12797077 A JP 12797077A JP 12797077 A JP12797077 A JP 12797077A JP S5461531 A JPS5461531 A JP S5461531A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- stands
- poly
- substrate
- irradiated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Photoreceptors In Electrophotography (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To sufficiently satisfy the sensitivity and resolution by heating a substrate in a constant temperature bath after a resist composed mainly of poly-α-cyanoacrylate with electron beams.
CONSTITUTION: An electron beam resist, whcih is composed mainly of poly-α- cyanoacrylate of Formula (wherein: X stands for cyano or carbamyl; R stands for a lower class alkyl; and n stands for a positive integer), poly-α-carbamylacrylate, or their copolymer, is formed on a substrate in a thickness of 0.5 to 1.5 microns and is prebaked at a low temperature. After having been irradiated with an electron beam, the substrate is heated in a constant temperature bath at 140 to 180°C for 5 to 60 minutes in accordance with the depth of the irradiated portion after development. The irradiated region is diffused by the heat treatment to leave a non-irradiated portion thereby to form a pattern
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP52127970A JPS5929853B2 (en) | 1977-10-25 | 1977-10-25 | Heat development method for electron beam resist |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP52127970A JPS5929853B2 (en) | 1977-10-25 | 1977-10-25 | Heat development method for electron beam resist |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5461531A true JPS5461531A (en) | 1979-05-17 |
JPS5929853B2 JPS5929853B2 (en) | 1984-07-24 |
Family
ID=14973181
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP52127970A Expired JPS5929853B2 (en) | 1977-10-25 | 1977-10-25 | Heat development method for electron beam resist |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5929853B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS585735A (en) * | 1981-06-01 | 1983-01-13 | Daikin Ind Ltd | Manufacture of patterned resist film on substrate |
JPS6435549A (en) * | 1987-07-31 | 1989-02-06 | Matsushita Electronics Corp | Resist pattern forming method |
WO2007029810A1 (en) * | 2005-09-09 | 2007-03-15 | Tokyo University Of Science Educational Foundation Administrative Organization | Process for producing 3-dimensional mold, process for producing microfabrication product, process for producing micropattern molding, 3-dimensional mold, microfabrication product, micropattern molding and optical device |
-
1977
- 1977-10-25 JP JP52127970A patent/JPS5929853B2/en not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS585735A (en) * | 1981-06-01 | 1983-01-13 | Daikin Ind Ltd | Manufacture of patterned resist film on substrate |
JPH0222371B2 (en) * | 1981-06-01 | 1990-05-18 | Daikin Ind Ltd | |
JPS6435549A (en) * | 1987-07-31 | 1989-02-06 | Matsushita Electronics Corp | Resist pattern forming method |
WO2007029810A1 (en) * | 2005-09-09 | 2007-03-15 | Tokyo University Of Science Educational Foundation Administrative Organization | Process for producing 3-dimensional mold, process for producing microfabrication product, process for producing micropattern molding, 3-dimensional mold, microfabrication product, micropattern molding and optical device |
Also Published As
Publication number | Publication date |
---|---|
JPS5929853B2 (en) | 1984-07-24 |
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