JPS54374B2 - - Google Patents

Info

Publication number
JPS54374B2
JPS54374B2 JP9018276A JP9018276A JPS54374B2 JP S54374 B2 JPS54374 B2 JP S54374B2 JP 9018276 A JP9018276 A JP 9018276A JP 9018276 A JP9018276 A JP 9018276A JP S54374 B2 JPS54374 B2 JP S54374B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9018276A
Other versions
JPS5316578A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP9018276A priority Critical patent/JPS5316578A/ja
Priority to US05/820,707 priority patent/US4145615A/en
Publication of JPS5316578A publication Critical patent/JPS5316578A/ja
Publication of JPS54374B2 publication Critical patent/JPS54374B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP9018276A 1976-07-30 1976-07-30 Electron beam exposure apparatus Granted JPS5316578A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP9018276A JPS5316578A (en) 1976-07-30 1976-07-30 Electron beam exposure apparatus
US05/820,707 US4145615A (en) 1976-07-30 1977-08-01 Electron beam exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9018276A JPS5316578A (en) 1976-07-30 1976-07-30 Electron beam exposure apparatus

Publications (2)

Publication Number Publication Date
JPS5316578A JPS5316578A (en) 1978-02-15
JPS54374B2 true JPS54374B2 (ja) 1979-01-10

Family

ID=13991335

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9018276A Granted JPS5316578A (en) 1976-07-30 1976-07-30 Electron beam exposure apparatus

Country Status (2)

Country Link
US (1) US4145615A (ja)
JP (1) JPS5316578A (ja)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4163155A (en) * 1978-04-07 1979-07-31 Bell Telephone Laboratories, Incorporated Defining a low-density pattern in a photoresist with an electron beam exposure system
US4280186A (en) * 1978-07-07 1981-07-21 Tokyo Shibaura Denki Kabushiki Kaisha Exposure apparatus using electron beams
DE2837590A1 (de) * 1978-08-29 1980-03-13 Ibm Deutschland Verfahren zur schattenwurfbelichtung
US4227090A (en) * 1979-02-21 1980-10-07 Hughes Aircraft Company Electron beam microfabrication apparatus and method
JPS55146931A (en) * 1979-05-04 1980-11-15 Hitachi Ltd Depicting method by electronic beam
JPS5610926A (en) * 1979-07-06 1981-02-03 Hitachi Ltd Electron beam drawing device
JPS583228A (ja) * 1981-06-30 1983-01-10 Toshiba Corp 荷電ビ−ム光学鏡筒
JPS5840826A (ja) * 1981-09-03 1983-03-09 Toshiba Corp 荷電ビ−ム露光方法
JPS5875746A (ja) * 1981-10-30 1983-05-07 Toshiba Corp 荷電ビ−ム光学鏡筒
JPS59205553A (ja) * 1983-05-06 1984-11-21 株式会社ボッシュオートモーティブ　システム 車両用空気調和装置用コンプレツサの制御装置
GB8415623D0 (en) * 1984-06-19 1984-07-25 Nixon W C Charged particle sources
FR2597259A1 (fr) * 1986-04-15 1987-10-16 Thomson Csf Dispositif a faisceau electronique pour projeter l'image d'un objet sur un echantillon
US6107636A (en) * 1997-02-07 2000-08-22 Canon Kabushiki Kaisha Electron beam exposure apparatus and its control method

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5251871A (en) * 1975-10-23 1977-04-26 Rikagaku Kenkyusho Projecting method for charge particle beams
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
JPS52103967A (en) * 1976-02-05 1977-08-31 Western Electric Co Method of iluminating surface of material to be machined and apparatus therefor
JPS52119185A (en) * 1976-03-31 1977-10-06 Fujitsu Ltd Electron beam exposure equipment

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3257555A (en) * 1963-10-14 1966-06-21 United Aircraft Corp Pattern scanning system
US3914608A (en) * 1973-12-19 1975-10-21 Westinghouse Electric Corp Rapid exposure of micropatterns with a scanning electron microscope
US4063103A (en) * 1975-04-11 1977-12-13 Tokyo Shibaura Electric Co., Ltd. Electron beam exposure apparatus

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5251871A (en) * 1975-10-23 1977-04-26 Rikagaku Kenkyusho Projecting method for charge particle beams
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
JPS52103967A (en) * 1976-02-05 1977-08-31 Western Electric Co Method of iluminating surface of material to be machined and apparatus therefor
JPS52119185A (en) * 1976-03-31 1977-10-06 Fujitsu Ltd Electron beam exposure equipment

Also Published As

Publication number Publication date
JPS5316578A (en) 1978-02-15
US4145615A (en) 1979-03-20

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