JPS5417015A - Radiation sensitive composite - Google Patents
Radiation sensitive compositeInfo
- Publication number
- JPS5417015A JPS5417015A JP8131977A JP8131977A JPS5417015A JP S5417015 A JPS5417015 A JP S5417015A JP 8131977 A JP8131977 A JP 8131977A JP 8131977 A JP8131977 A JP 8131977A JP S5417015 A JPS5417015 A JP S5417015A
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- radiation sensitive
- sensitive composite
- contraining
- ager
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002131 composite material Substances 0.000 title 1
- 230000005855 radiation Effects 0.000 title 1
- 230000002285 radioactive effect Effects 0.000 abstract 1
- 239000002683 reaction inhibitor Substances 0.000 abstract 1
- DUAJIKVIRGATIW-UHFFFAOYSA-N trinitrogen(.) Chemical compound [N]=[N+]=[N-] DUAJIKVIRGATIW-UHFFFAOYSA-N 0.000 abstract 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8131977A JPS5417015A (en) | 1977-07-06 | 1977-07-06 | Radiation sensitive composite |
| US06/059,845 US4279986A (en) | 1977-06-01 | 1979-07-23 | Negative resist and radical scavenger composition with capability of preventing post-irradiation polymerization |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8131977A JPS5417015A (en) | 1977-07-06 | 1977-07-06 | Radiation sensitive composite |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5417015A true JPS5417015A (en) | 1979-02-08 |
| JPS6113734B2 JPS6113734B2 (enExample) | 1986-04-15 |
Family
ID=13743069
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8131977A Granted JPS5417015A (en) | 1977-06-01 | 1977-07-06 | Radiation sensitive composite |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5417015A (enExample) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5677843A (en) * | 1979-11-30 | 1981-06-26 | Fujitsu Ltd | Resist pattern forming method |
| JPS5869217A (ja) * | 1981-10-22 | 1983-04-25 | Japan Synthetic Rubber Co Ltd | 感光性シリコ−ン樹脂組成物 |
| JPS58502169A (ja) * | 1981-12-21 | 1983-12-15 | インステイテユ−ト ヒミイ アカデミイ ナウク エスエスエスア−ル | フォト−及び電子線レジスト |
| JPS6024543A (ja) * | 1983-07-20 | 1985-02-07 | Hitachi Chem Co Ltd | 感光性シリコ−ン樹脂組成物 |
| US5418113A (en) * | 1988-11-18 | 1995-05-23 | Canon Kabushiki Kaisha | Photosensitive resin composition and method of preparing volume type phase hologram member using same |
-
1977
- 1977-07-06 JP JP8131977A patent/JPS5417015A/ja active Granted
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5677843A (en) * | 1979-11-30 | 1981-06-26 | Fujitsu Ltd | Resist pattern forming method |
| JPS5869217A (ja) * | 1981-10-22 | 1983-04-25 | Japan Synthetic Rubber Co Ltd | 感光性シリコ−ン樹脂組成物 |
| JPS58502169A (ja) * | 1981-12-21 | 1983-12-15 | インステイテユ−ト ヒミイ アカデミイ ナウク エスエスエスア−ル | フォト−及び電子線レジスト |
| JPS6024543A (ja) * | 1983-07-20 | 1985-02-07 | Hitachi Chem Co Ltd | 感光性シリコ−ン樹脂組成物 |
| US5418113A (en) * | 1988-11-18 | 1995-05-23 | Canon Kabushiki Kaisha | Photosensitive resin composition and method of preparing volume type phase hologram member using same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6113734B2 (enExample) | 1986-04-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS5299776A (en) | Radiation sensitive high polymeric material | |
| JPS5417015A (en) | Radiation sensitive composite | |
| JPS526896A (en) | Device to predict the output distribution of atomic reactor | |
| JPS5427369A (en) | Pattern formation method | |
| JPS53105700A (en) | Radioactive ray shielding material | |
| JPS52120686A (en) | Electronic ray exposure method | |
| JPS522777A (en) | Radiation detector | |
| JPS5381116A (en) | Radiation sensitive polymer and its working method | |
| JPS5417014A (en) | Radiation sensitive composite | |
| JPS534382A (en) | High frequency illuminator | |
| JPS5230487A (en) | Thermofluorescence dosimeter element | |
| JPS5368994A (en) | X-ray apparatus | |
| JPS53128278A (en) | Production of lsi mask | |
| JPS51126150A (en) | Electro-photo sensitive materials | |
| JPS5277999A (en) | Shielding block for neutron | |
| JPS5223387A (en) | Thermoluminescence dosimeter | |
| JPS5357878A (en) | Peak value detector | |
| JPS5283062A (en) | Photoetching method | |
| JPS5272099A (en) | Tentative treatment method for radioactive solid waste | |
| JPS5436470A (en) | Floating prevention device of nuclear fuel assembly | |
| JPS5390766A (en) | Exposure method | |
| JPS53102774A (en) | Dose setter | |
| JPS5416182A (en) | X-ray exposure apparatus | |
| JPS5235777A (en) | Radiation intensifying screen | |
| JPS5411680A (en) | Exposure unit of electron beam |