JPS54157076A - Electron gun - Google Patents
Electron gunInfo
- Publication number
- JPS54157076A JPS54157076A JP6536878A JP6536878A JPS54157076A JP S54157076 A JPS54157076 A JP S54157076A JP 6536878 A JP6536878 A JP 6536878A JP 6536878 A JP6536878 A JP 6536878A JP S54157076 A JPS54157076 A JP S54157076A
- Authority
- JP
- Japan
- Prior art keywords
- lens
- caliber
- grids
- distance
- relation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To improve effectively aberration by making the caliber of a deceleration- type bipotential lens system smaller than the caliber of the extended field effect-type acceleration lens system and holding the practical focus relation of an electron gun.
CONSTITUTION: Anode voltage VA is applied to grids G3 and G6, and voltages 0.3VA and 0.5VA are applied to grids G4 and G5 respectively. Then, deceleration- type bipotential lens 1 is constituted by grids G3 and G4, and extended field effect- type acceleration lens 2 is constituted by grids G4, G6 and G5. The relation between caliber D1 (the edge diameter opposite to G3 and G4) of lens 1 and caliber D2 (the edge diameter of G4 and G6 opposite to G5) of lens 2 is selected to be 0.3≤D1/ D2<1. Then, the lens interval, the distance from lens 1 to the caliber step part of grid G4, the distance from the step part to the intermediate point between G4 and G5, and the distance from the intermediate point between G4 and G5 to the intermediate point between G5 and G6 are denoted as l, λ2, λ3, and λ4, and the relation among them is selected to be λ2+λ3=l-λ4/2≥2D2. Further, when 0.3≤λ4/D2≤ 1 is selected, this main electron lens has a small spherical aberration, and blooming of a beam spot is avoided effectively on the fluorescent surface.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6536878A JPS54157076A (en) | 1978-05-31 | 1978-05-31 | Electron gun |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6536878A JPS54157076A (en) | 1978-05-31 | 1978-05-31 | Electron gun |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS54157076A true JPS54157076A (en) | 1979-12-11 |
JPH0353733B2 JPH0353733B2 (en) | 1991-08-16 |
Family
ID=13284940
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6536878A Granted JPS54157076A (en) | 1978-05-31 | 1978-05-31 | Electron gun |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54157076A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58147943A (en) * | 1982-09-25 | 1983-09-02 | Sony Corp | Electron gun |
-
1978
- 1978-05-31 JP JP6536878A patent/JPS54157076A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58147943A (en) * | 1982-09-25 | 1983-09-02 | Sony Corp | Electron gun |
Also Published As
Publication number | Publication date |
---|---|
JPH0353733B2 (en) | 1991-08-16 |
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