JPS54144172A - Electron gun - Google Patents

Electron gun

Info

Publication number
JPS54144172A
JPS54144172A JP5126878A JP5126878A JPS54144172A JP S54144172 A JPS54144172 A JP S54144172A JP 5126878 A JP5126878 A JP 5126878A JP 5126878 A JP5126878 A JP 5126878A JP S54144172 A JPS54144172 A JP S54144172A
Authority
JP
Japan
Prior art keywords
electrode
electrodes
spherical aberration
electron lens
constitution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5126878A
Other languages
Japanese (ja)
Inventor
Masaya Takenobu
Shoichi Washino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP5126878A priority Critical patent/JPS54144172A/en
Publication of JPS54144172A publication Critical patent/JPS54144172A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To decrease spherical aberration, by suitably selecting the electrode length and the electrode voltage, with the electrode constitution the same as the unipotential type electron lens.
CONSTITUTION: The electron lens is composed of three electrodes, and the same potential Eb is applied to the both electrodes 8, and Ef is applied to the intermediate electrode 9. In this case, the spherical aberration Cs is smaller by making longer the length Lf of the intermediate electrode 9, but it saturates at Lf/2R≥1.5. The longer Lf, the higher Ef, and it is recommended that the range of Lf is Lf/2R≤A-2 (Ef/Eb)2 + 0.85, where; A =0.185. Further, when three electrodes are almost of the same diameter, the electron lens having small spherical aberration can be constituted by this method.
COPYRIGHT: (C)1979,JPO&Japio
JP5126878A 1978-04-29 1978-04-29 Electron gun Pending JPS54144172A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5126878A JPS54144172A (en) 1978-04-29 1978-04-29 Electron gun

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5126878A JPS54144172A (en) 1978-04-29 1978-04-29 Electron gun

Publications (1)

Publication Number Publication Date
JPS54144172A true JPS54144172A (en) 1979-11-10

Family

ID=12882189

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5126878A Pending JPS54144172A (en) 1978-04-29 1978-04-29 Electron gun

Country Status (1)

Country Link
JP (1) JPS54144172A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0723700A4 (en) * 1992-08-28 1996-01-04 Kern K N Chang An improved cathode ray tube apparatus with reduced beam spot size

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5156175A (en) * 1974-11-12 1976-05-17 Matsushita Electric Ind Co Ltd INKYOKUSEN KANDENSHIJU

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5156175A (en) * 1974-11-12 1976-05-17 Matsushita Electric Ind Co Ltd INKYOKUSEN KANDENSHIJU

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0723700A4 (en) * 1992-08-28 1996-01-04 Kern K N Chang An improved cathode ray tube apparatus with reduced beam spot size
EP0723700A1 (en) * 1992-08-28 1996-07-31 CHANG, Kern K. N. An improved cathode ray tube apparatus with reduced beam spot size

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