JPS5412215B2 - - Google Patents

Info

Publication number
JPS5412215B2
JPS5412215B2 JP10805373A JP10805373A JPS5412215B2 JP S5412215 B2 JPS5412215 B2 JP S5412215B2 JP 10805373 A JP10805373 A JP 10805373A JP 10805373 A JP10805373 A JP 10805373A JP S5412215 B2 JPS5412215 B2 JP S5412215B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10805373A
Other languages
Japanese (ja)
Other versions
JPS4970702A (fr
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4970702A publication Critical patent/JPS4970702A/ja
Priority to US05/692,599 priority Critical patent/US4072528A/en
Priority to US05/692,600 priority patent/US4072527A/en
Publication of JPS5412215B2 publication Critical patent/JPS5412215B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/115Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0073Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP10805373A 1972-09-27 1973-09-27 Expired JPS5412215B2 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US05/692,599 US4072528A (en) 1972-09-27 1976-06-03 Oxygen barrier layers for photopolymerizable elements
US05/692,600 US4072527A (en) 1972-09-27 1976-06-03 Oxygen barrier layers for photopolymerizable elements

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29250372A 1972-09-27 1972-09-27
US29250172A 1972-09-27 1972-09-27

Publications (2)

Publication Number Publication Date
JPS4970702A JPS4970702A (fr) 1974-07-09
JPS5412215B2 true JPS5412215B2 (fr) 1979-05-21

Family

ID=26967376

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10805373A Expired JPS5412215B2 (fr) 1972-09-27 1973-09-27

Country Status (2)

Country Link
JP (1) JPS5412215B2 (fr)
DE (1) DE2347784C3 (fr)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1975708A2 (fr) 2007-03-30 2008-10-01 FUJIFILM Corporation Précurseur de plaque d'impression lithographique
EP2383118A2 (fr) 2010-04-30 2011-11-02 Fujifilm Corporation Précurseur de plaque d'impression lithographique, procédé de fabrication de plaque correspondant et composé d'isocyanate polyvalent
EP2492752A1 (fr) 2011-02-28 2012-08-29 Fujifilm Corporation Précurseur de plaque d'impression lithographique et procédé de fabrication de plaque correspondant
WO2013046877A1 (fr) 2011-09-30 2013-04-04 富士フイルム株式会社 Procédé d'impression utilisant un précurseur de plaque d'impression lithographique à développement sur presse
EP2644380A2 (fr) 2012-03-27 2013-10-02 Fujifilm Corporation Précurseur de plaque d'impression lithographique
WO2014002835A1 (fr) 2012-06-29 2014-01-03 富士フイルム株式会社 Procédé de concentration de liquide de déchets de traitement et procédé de recyclage de liquide de déchets de traitement
WO2014045783A1 (fr) 2012-09-20 2014-03-27 富士フイルム株式会社 Plaque d'impression planographique originale et procédé de fabrication de plaque
WO2014050435A1 (fr) 2012-09-26 2014-04-03 富士フイルム株式会社 Plaque originale d'impression lithographique et procédé de fabrication de plaque
WO2014050359A1 (fr) 2012-09-26 2014-04-03 富士フイルム株式会社 Plaque lithographique présensibilisée et procédé de fabrication de plaque d'impression lithographique

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5512974A (en) * 1978-07-15 1980-01-29 Konishiroku Photo Ind Co Ltd Photosensitive printing plate
JPS5734558A (en) * 1980-08-11 1982-02-24 Fuji Photo Film Co Ltd Photosensitive printing plate
US7282321B2 (en) 2003-03-26 2007-10-16 Fujifilm Corporation Lithographic printing method and presensitized plate
US20050153239A1 (en) 2004-01-09 2005-07-14 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor and lithographic printing method using the same
EP2246741A1 (fr) 2004-05-19 2010-11-03 Fujifilm Corporation Procédé d'enregistrement d'image
EP2618215B1 (fr) 2004-05-31 2017-07-05 Fujifilm Corporation Procédé de fabrication d'une plaque d'impression lithographique
JP2006021396A (ja) 2004-07-07 2006-01-26 Fuji Photo Film Co Ltd 平版印刷版原版および平版印刷方法
DE602005007427D1 (de) 2004-07-20 2008-07-24 Fujifilm Corp Bilderzeugendes Material
US7425406B2 (en) 2004-07-27 2008-09-16 Fujifilm Corporation Lithographic printing plate precursor and lithographic printing method
US20060032390A1 (en) 2004-07-30 2006-02-16 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor and lithographic printing method
JP2006062188A (ja) 2004-08-26 2006-03-09 Fuji Photo Film Co Ltd 色画像形成材料及び平版印刷版原版
JP5089866B2 (ja) 2004-09-10 2012-12-05 富士フイルム株式会社 平版印刷方法
US20060150846A1 (en) 2004-12-13 2006-07-13 Fuji Photo Film Co. Ltd Lithographic printing method
JP2006181838A (ja) 2004-12-27 2006-07-13 Fuji Photo Film Co Ltd 平版印刷版原版
EP1696268B1 (fr) 2005-02-28 2016-11-09 FUJIFILM Corporation Précurseur de plaque d'impression lithographique
JP4457034B2 (ja) 2005-03-28 2010-04-28 富士フイルム株式会社 感光性平版印刷版
JP4759343B2 (ja) 2005-08-19 2011-08-31 富士フイルム株式会社 平版印刷版原版および平版印刷方法
JP4881756B2 (ja) 2007-02-06 2012-02-22 富士フイルム株式会社 感光性組成物、平版印刷版原版、平版印刷方法、及び新規シアニン色素
DE602008001572D1 (de) 2007-03-23 2010-08-05 Fujifilm Corp Negativ-Lithografiedruckplattenvorläufer und Lithografiedruckverfahren damit
JP5046744B2 (ja) 2007-05-18 2012-10-10 富士フイルム株式会社 平版印刷版原版、及びそれを用いた印刷方法
EP2006738B1 (fr) 2007-06-21 2017-09-06 Fujifilm Corporation Précurseur de plaque d'impression lithographique
EP2006091B1 (fr) 2007-06-22 2010-12-08 FUJIFILM Corporation Précurseur de plaque d'impression lithographique et procédé de fabrication de plaque
DE602008002963D1 (de) 2007-07-02 2010-11-25 Fujifilm Corp Flachdruckplattenvorläufer und Flachdruckverfahren damit
JP2009069761A (ja) 2007-09-18 2009-04-02 Fujifilm Corp 平版印刷版の製版方法
JP5322537B2 (ja) 2007-10-29 2013-10-23 富士フイルム株式会社 平版印刷版原版
JP5155677B2 (ja) 2008-01-22 2013-03-06 富士フイルム株式会社 平版印刷版原版、およびその製版方法
JP2009184188A (ja) 2008-02-05 2009-08-20 Fujifilm Corp 平版印刷版原版および印刷方法
JP2009214428A (ja) 2008-03-11 2009-09-24 Fujifilm Corp 平版印刷版原版および平版印刷方法
JP2009236942A (ja) 2008-03-25 2009-10-15 Fujifilm Corp 平版印刷版原版及びその製版方法
EP2110261B1 (fr) 2008-04-18 2018-03-28 FUJIFILM Corporation Plaque d'alliage en aluminium pour plaque d'impression lithographique, support de plaque d'impression lithographique, plaque présensibilisée, procédé de fabrication d'une plaque en alliage d'aluminium et procédé de fabrication du support de plaque d'impression lithographique
JP5296434B2 (ja) 2008-07-16 2013-09-25 富士フイルム株式会社 平版印刷版用原版
JP5444933B2 (ja) 2008-08-29 2014-03-19 富士フイルム株式会社 ネガ型平版印刷版原版及びそれを用いる平版印刷方法
JP5408942B2 (ja) 2008-09-22 2014-02-05 富士フイルム株式会社 平版印刷版原版および製版方法
JP5449898B2 (ja) 2008-09-22 2014-03-19 富士フイルム株式会社 平版印刷版原版、及びそれを用いた印刷方法
JP5660268B2 (ja) 2008-09-30 2015-01-28 富士フイルム株式会社 平版印刷版原版、平版印刷版の製版方法及び重合性モノマー
JP5705584B2 (ja) 2011-02-24 2015-04-22 富士フイルム株式会社 平版印刷版の製版方法

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1975708A2 (fr) 2007-03-30 2008-10-01 FUJIFILM Corporation Précurseur de plaque d'impression lithographique
EP2383118A2 (fr) 2010-04-30 2011-11-02 Fujifilm Corporation Précurseur de plaque d'impression lithographique, procédé de fabrication de plaque correspondant et composé d'isocyanate polyvalent
EP2492752A1 (fr) 2011-02-28 2012-08-29 Fujifilm Corporation Précurseur de plaque d'impression lithographique et procédé de fabrication de plaque correspondant
WO2013046877A1 (fr) 2011-09-30 2013-04-04 富士フイルム株式会社 Procédé d'impression utilisant un précurseur de plaque d'impression lithographique à développement sur presse
EP2644380A2 (fr) 2012-03-27 2013-10-02 Fujifilm Corporation Précurseur de plaque d'impression lithographique
WO2014002835A1 (fr) 2012-06-29 2014-01-03 富士フイルム株式会社 Procédé de concentration de liquide de déchets de traitement et procédé de recyclage de liquide de déchets de traitement
WO2014045783A1 (fr) 2012-09-20 2014-03-27 富士フイルム株式会社 Plaque d'impression planographique originale et procédé de fabrication de plaque
WO2014050435A1 (fr) 2012-09-26 2014-04-03 富士フイルム株式会社 Plaque originale d'impression lithographique et procédé de fabrication de plaque
WO2014050359A1 (fr) 2012-09-26 2014-04-03 富士フイルム株式会社 Plaque lithographique présensibilisée et procédé de fabrication de plaque d'impression lithographique

Also Published As

Publication number Publication date
DE2347784B2 (de) 1976-04-01
DE2347784A1 (de) 1974-04-11
DE2347784C3 (de) 1978-11-23
JPS4970702A (fr) 1974-07-09

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