JPS54109767A - Forming method of amorphous semiconductor layer - Google Patents
Forming method of amorphous semiconductor layerInfo
- Publication number
- JPS54109767A JPS54109767A JP1674978A JP1674978A JPS54109767A JP S54109767 A JPS54109767 A JP S54109767A JP 1674978 A JP1674978 A JP 1674978A JP 1674978 A JP1674978 A JP 1674978A JP S54109767 A JPS54109767 A JP S54109767A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- specific resistance
- amorphous semiconductor
- tube
- semiconductor layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Photovoltaic Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1674978A JPS54109767A (en) | 1978-02-16 | 1978-02-16 | Forming method of amorphous semiconductor layer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1674978A JPS54109767A (en) | 1978-02-16 | 1978-02-16 | Forming method of amorphous semiconductor layer |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS54109767A true JPS54109767A (en) | 1979-08-28 |
JPS6225250B2 JPS6225250B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1987-06-02 |
Family
ID=11924907
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1674978A Granted JPS54109767A (en) | 1978-02-16 | 1978-02-16 | Forming method of amorphous semiconductor layer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54109767A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0738125A (ja) * | 1980-05-19 | 1995-02-07 | Energy Conversion Devices Inc | 太陽電池の製造方法および装置、並びに無定形シリコンの被着方法および被着チャンバ |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102443301B1 (ko) | 2021-11-25 | 2022-09-16 | 주식회사 파트리지시스템즈 | 다양한 데이터 처리를 위한 적응형 데이터 처리 시스템 및 방법 |
-
1978
- 1978-02-16 JP JP1674978A patent/JPS54109767A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0738125A (ja) * | 1980-05-19 | 1995-02-07 | Energy Conversion Devices Inc | 太陽電池の製造方法および装置、並びに無定形シリコンの被着方法および被着チャンバ |
Also Published As
Publication number | Publication date |
---|---|
JPS6225250B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1987-06-02 |
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