JPS54101389A - Foreign matter inspecting method - Google Patents

Foreign matter inspecting method

Info

Publication number
JPS54101389A
JPS54101389A JP727678A JP727678A JPS54101389A JP S54101389 A JPS54101389 A JP S54101389A JP 727678 A JP727678 A JP 727678A JP 727678 A JP727678 A JP 727678A JP S54101389 A JPS54101389 A JP S54101389A
Authority
JP
Japan
Prior art keywords
reflected light
foreign matter
inspecting
semiconductor wafer
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP727678A
Other languages
Japanese (ja)
Other versions
JPS6342222B2 (en
Inventor
Masakuni Akiba
Hiroto Nagatomo
Jun Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP727678A priority Critical patent/JPS54101389A/en
Publication of JPS54101389A publication Critical patent/JPS54101389A/en
Publication of JPS6342222B2 publication Critical patent/JPS6342222B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To automatically inspect foreign matter rapidly by performing radiation of analyzing rays plural times in correspondence to each direction at varying radiation angles to the stepped surfaces of undulations and judging only the reflected light which has commonly been detected from the results of the plural detections as the reflected light from the foreign matter. CONSTITUTION:5 is an inspecting XY table, 6 a focusing leaf spring, 7 an auto fucusing device, 8 a wafer rest table, 9 the semiconductor wafer under inspection, 10 an objective lens, 11 an observation illuminating light radiating mirror, 12 a lens, 13 an obserbation illuminating lamp, 14 a field of view changing prism, 15 an eyepiece lens for visual observation, 16 an eyepiece lens for automatic inspection and 17 a photo diode array for converting the reflected light to electric signal by detecting the same and the output thereof is arithmetically processed, whereby the foregin matter inspection is automatically accomplished. 18 is an inspecting light source and the same number of said light sources as the number in the direction of the stepped surfaces of the undulations of the semiconductor wafer under inspection are installed in correspondence thereto and when each of these repeats flashing by a constant sequence, the radiation directions of the inspecting rays to the semiconductor wafer are changed. And only the reflected light commonly observed is judged to be the reflected light from the foreign matter.
JP727678A 1978-01-27 1978-01-27 Foreign matter inspecting method Granted JPS54101389A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP727678A JPS54101389A (en) 1978-01-27 1978-01-27 Foreign matter inspecting method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP727678A JPS54101389A (en) 1978-01-27 1978-01-27 Foreign matter inspecting method

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP8177984A Division JPS6063449A (en) 1984-04-25 1984-04-25 Defect examination device
JP8178084A Division JPS6063450A (en) 1984-04-25 1984-04-25 Defect examination device

Publications (2)

Publication Number Publication Date
JPS54101389A true JPS54101389A (en) 1979-08-09
JPS6342222B2 JPS6342222B2 (en) 1988-08-22

Family

ID=11661497

Family Applications (1)

Application Number Title Priority Date Filing Date
JP727678A Granted JPS54101389A (en) 1978-01-27 1978-01-27 Foreign matter inspecting method

Country Status (1)

Country Link
JP (1) JPS54101389A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5671173A (en) * 1979-11-14 1981-06-13 Hitachi Ltd Pattern detection method of printed circuit substrate
JPS5767844A (en) * 1980-10-15 1982-04-24 Nippon Kogaku Kk <Nikon> Surface inspecting device
JPS5797261U (en) * 1980-12-05 1982-06-15
JPS59135353A (en) * 1983-01-24 1984-08-03 Toshiba Corp Surface flaw detecting apparatus
US5331396A (en) * 1991-10-08 1994-07-19 Matsushita Electric Industrial Co., Ltd. Foreign matter detection device

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5671173A (en) * 1979-11-14 1981-06-13 Hitachi Ltd Pattern detection method of printed circuit substrate
JPS6225221B2 (en) * 1979-11-14 1987-06-02 Hitachi Ltd
JPS5767844A (en) * 1980-10-15 1982-04-24 Nippon Kogaku Kk <Nikon> Surface inspecting device
JPS6321855B2 (en) * 1980-10-15 1988-05-09 Nippon Kogaku Kk
JPS5797261U (en) * 1980-12-05 1982-06-15
JPS59135353A (en) * 1983-01-24 1984-08-03 Toshiba Corp Surface flaw detecting apparatus
JPH0236893B2 (en) * 1983-01-24 1990-08-21 Tokyo Shibaura Electric Co
US5331396A (en) * 1991-10-08 1994-07-19 Matsushita Electric Industrial Co., Ltd. Foreign matter detection device

Also Published As

Publication number Publication date
JPS6342222B2 (en) 1988-08-22

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