JPS5383468A - Mask aligning method - Google Patents

Mask aligning method

Info

Publication number
JPS5383468A
JPS5383468A JP15918676A JP15918676A JPS5383468A JP S5383468 A JPS5383468 A JP S5383468A JP 15918676 A JP15918676 A JP 15918676A JP 15918676 A JP15918676 A JP 15918676A JP S5383468 A JPS5383468 A JP S5383468A
Authority
JP
Japan
Prior art keywords
aligning method
mask aligning
mask
langer
superposing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15918676A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5726406B2 (enrdf_load_html_response
Inventor
Shunji Kashiwagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15918676A priority Critical patent/JPS5383468A/ja
Publication of JPS5383468A publication Critical patent/JPS5383468A/ja
Publication of JPS5726406B2 publication Critical patent/JPS5726406B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP15918676A 1976-12-28 1976-12-28 Mask aligning method Granted JPS5383468A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15918676A JPS5383468A (en) 1976-12-28 1976-12-28 Mask aligning method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15918676A JPS5383468A (en) 1976-12-28 1976-12-28 Mask aligning method

Publications (2)

Publication Number Publication Date
JPS5383468A true JPS5383468A (en) 1978-07-22
JPS5726406B2 JPS5726406B2 (enrdf_load_html_response) 1982-06-04

Family

ID=15688182

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15918676A Granted JPS5383468A (en) 1976-12-28 1976-12-28 Mask aligning method

Country Status (1)

Country Link
JP (1) JPS5383468A (enrdf_load_html_response)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6900463B1 (en) 1980-06-30 2005-05-31 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6900463B1 (en) 1980-06-30 2005-05-31 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device

Also Published As

Publication number Publication date
JPS5726406B2 (enrdf_load_html_response) 1982-06-04

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