JPS5376825A - Radiation sensitive positive regist material - Google Patents

Radiation sensitive positive regist material

Info

Publication number
JPS5376825A
JPS5376825A JP15203176A JP15203176A JPS5376825A JP S5376825 A JPS5376825 A JP S5376825A JP 15203176 A JP15203176 A JP 15203176A JP 15203176 A JP15203176 A JP 15203176A JP S5376825 A JPS5376825 A JP S5376825A
Authority
JP
Japan
Prior art keywords
regist
radiation sensitive
sensitive positive
positive
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15203176A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5654620B2 (enExample
Inventor
Tsukasa Tada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHO LSI GIJUTSU KENKYU KUMIAI
Priority to JP15203176A priority Critical patent/JPS5376825A/ja
Publication of JPS5376825A publication Critical patent/JPS5376825A/ja
Publication of JPS5654620B2 publication Critical patent/JPS5654620B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP15203176A 1976-12-20 1976-12-20 Radiation sensitive positive regist material Granted JPS5376825A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15203176A JPS5376825A (en) 1976-12-20 1976-12-20 Radiation sensitive positive regist material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15203176A JPS5376825A (en) 1976-12-20 1976-12-20 Radiation sensitive positive regist material

Publications (2)

Publication Number Publication Date
JPS5376825A true JPS5376825A (en) 1978-07-07
JPS5654620B2 JPS5654620B2 (enExample) 1981-12-26

Family

ID=15531537

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15203176A Granted JPS5376825A (en) 1976-12-20 1976-12-20 Radiation sensitive positive regist material

Country Status (1)

Country Link
JP (1) JPS5376825A (enExample)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53135703A (en) * 1977-04-26 1978-11-27 Int Standard Electric Corp Resist material for printing xxray lithographic plate
JPS5511217A (en) * 1978-07-10 1980-01-26 Nippon Telegr & Teleph Corp <Ntt> Pattern forming method using radiation sensitive high polymer
JPS5639537A (en) * 1979-09-07 1981-04-15 Chiyou Lsi Gijutsu Kenkyu Kumiai Ionized radiation sensitive resist
JPS5639536A (en) * 1979-09-07 1981-04-15 Chiyou Lsi Gijutsu Kenkyu Kumiai Ionizing radiation sensitive resist
JPS5860536A (ja) * 1981-10-06 1983-04-11 Toshiba Corp レジスト像形成方法
JPH02256055A (ja) * 1988-05-26 1990-10-16 Fujitsu Ltd レジスト材料およびこのレジスト材料を使用するパターン形成方法
WO2017098727A1 (ja) * 2015-12-11 2017-06-15 富士フイルム株式会社 光学機能性層作製用組成物、光学フィルム、および液晶表示装置
WO2020170555A1 (ja) * 2019-02-22 2020-08-27 東洋合成工業株式会社 ポリマー、該ポリマーを含有するレジスト組成物、それを用いた部材の製造方法、パターン形成方法及び反転パターンの形成方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5187971A (en) * 1975-01-29 1976-07-31 Ibm Denjiimushoshanyoru rejisutozo no keiseihoho
JPS5344441U (enExample) * 1976-09-20 1978-04-15

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5187971A (en) * 1975-01-29 1976-07-31 Ibm Denjiimushoshanyoru rejisutozo no keiseihoho
JPS5344441U (enExample) * 1976-09-20 1978-04-15

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53135703A (en) * 1977-04-26 1978-11-27 Int Standard Electric Corp Resist material for printing xxray lithographic plate
JPS5511217A (en) * 1978-07-10 1980-01-26 Nippon Telegr & Teleph Corp <Ntt> Pattern forming method using radiation sensitive high polymer
JPS5639537A (en) * 1979-09-07 1981-04-15 Chiyou Lsi Gijutsu Kenkyu Kumiai Ionized radiation sensitive resist
JPS5639536A (en) * 1979-09-07 1981-04-15 Chiyou Lsi Gijutsu Kenkyu Kumiai Ionizing radiation sensitive resist
JPS5860536A (ja) * 1981-10-06 1983-04-11 Toshiba Corp レジスト像形成方法
JPH02256055A (ja) * 1988-05-26 1990-10-16 Fujitsu Ltd レジスト材料およびこのレジスト材料を使用するパターン形成方法
WO2017098727A1 (ja) * 2015-12-11 2017-06-15 富士フイルム株式会社 光学機能性層作製用組成物、光学フィルム、および液晶表示装置
JPWO2017098727A1 (ja) * 2015-12-11 2018-07-12 富士フイルム株式会社 光学機能性層作製用組成物、光学フィルム、および液晶表示装置
US10597478B2 (en) 2015-12-11 2020-03-24 Fujifilm Corporation Composition for preparing optical functional layer, optical film, and liquid crystal display device
WO2020170555A1 (ja) * 2019-02-22 2020-08-27 東洋合成工業株式会社 ポリマー、該ポリマーを含有するレジスト組成物、それを用いた部材の製造方法、パターン形成方法及び反転パターンの形成方法
KR20210131379A (ko) * 2019-02-22 2021-11-02 도요 고세이 고교 가부시키가이샤 폴리머, 해당 폴리머를 함유하는 레지스트 조성물, 그것을 이용한 부재의 제조 방법, 패턴 형성 방법 및 반전 패턴의 형성 방법
JPWO2020170555A1 (ja) * 2019-02-22 2021-12-23 東洋合成工業株式会社 ポリマー、該ポリマーを含有するレジスト組成物、それを用いた部材の製造方法、パターン形成方法及び反転パターンの形成方法
TWI816948B (zh) * 2019-02-22 2023-10-01 日商東洋合成工業股份有限公司 聚合物、含有該聚合物的抗蝕劑組合物、利用該抗蝕劑組合物的部件的製造方法、圖案形成方法以及反轉圖案的形成方法

Also Published As

Publication number Publication date
JPS5654620B2 (enExample) 1981-12-26

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