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Fujitsu Ltd
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Fujitsu Ltd
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Publication date
Application filed by Fujitsu LtdfiledCriticalFujitsu Ltd
Priority to JP13396576ApriorityCriticalpatent/JPS5358784A/en
Publication of JPS5358784ApublicationCriticalpatent/JPS5358784A/en
PURPOSE: Sufficiently large Hall coefficients may be obtained despite vapor deposition at a low substrate temperature and a Hall effect element capable of reducing the undulations on its surface may be obtained by substituting part of Sb with Bi.
COPYRIGHT: (C)1978,JPO&Japio
JP13396576A1976-11-081976-11-08Hall effect element
PendingJPS5358784A
(en)