JPS5345676A - Apparatus for coating granules - Google Patents

Apparatus for coating granules

Info

Publication number
JPS5345676A
JPS5345676A JP11871377A JP11871377A JPS5345676A JP S5345676 A JPS5345676 A JP S5345676A JP 11871377 A JP11871377 A JP 11871377A JP 11871377 A JP11871377 A JP 11871377A JP S5345676 A JPS5345676 A JP S5345676A
Authority
JP
Japan
Prior art keywords
coating granules
granules
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11871377A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6111661B2 (enExample
Inventor
Chiyoonshii Buraun Roido
Randorufu Rangurei Jiyon
Hamufurei Supuritsutsu Maikuru
Kooru Nooren Robaato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Atomics Corp
Original Assignee
General Atomics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US05/730,000 external-priority patent/US4080927A/en
Priority claimed from US05/735,186 external-priority patent/US4116160A/en
Priority claimed from US05/749,876 external-priority patent/US4098224A/en
Application filed by General Atomics Corp filed Critical General Atomics Corp
Publication of JPS5345676A publication Critical patent/JPS5345676A/ja
Publication of JPS6111661B2 publication Critical patent/JPS6111661B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/442Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using fluidised bed process
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21CNUCLEAR REACTORS
    • G21C3/00Reactor fuel elements and their assemblies; Selection of substances for use as reactor fuel elements
    • G21C3/42Selection of substances for use as reactor fuel
    • G21C3/58Solid reactor fuel Pellets made of fissile material
    • G21C3/62Ceramic fuel
    • G21C3/626Coated fuel particles
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00Energy generation of nuclear origin
    • Y02E30/30Nuclear fission reactors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Plasma & Fusion (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Glanulating (AREA)
  • Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
  • Carbon And Carbon Compounds (AREA)
JP11871377A 1976-10-06 1977-10-04 Apparatus for coating granules Granted JPS5345676A (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US73023576A 1976-10-06 1976-10-06
US05/730,000 US4080927A (en) 1976-10-06 1976-10-06 Fluidized bed-gas coater apparatus
US05/735,186 US4116160A (en) 1976-10-26 1976-10-26 Fluidized bed, gas coating apparatus
US05/749,876 US4098224A (en) 1976-12-13 1976-12-13 Gas coating apparatus

Publications (2)

Publication Number Publication Date
JPS5345676A true JPS5345676A (en) 1978-04-24
JPS6111661B2 JPS6111661B2 (enExample) 1986-04-04

Family

ID=27505591

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11871377A Granted JPS5345676A (en) 1976-10-06 1977-10-04 Apparatus for coating granules

Country Status (4)

Country Link
JP (1) JPS5345676A (enExample)
DE (1) DE2744611A1 (enExample)
FR (1) FR2366870A1 (enExample)
GB (1) GB1581283A (enExample)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5617063A (en) * 1979-07-20 1981-02-18 Mitsubishi Electric Corp Manufacture of semiconductor device
JPS5892272A (ja) * 1981-11-27 1983-06-01 Mitsubishi Electric Corp 負帰還型GaAsマイクロ波モノリシツク増幅回路装置
JPS5892271A (ja) * 1981-11-27 1983-06-01 Mitsubishi Electric Corp GaAsマイクロ波モノリシツク集積回路装置
JP2006003092A (ja) * 2004-06-15 2006-01-05 Nuclear Fuel Ind Ltd 流動床装置の被覆燃料物質回収方法及び装置
JP2012505309A (ja) * 2008-10-09 2012-03-01 コミサリア ア レネルジィ アトミーク エ オ ゼネ ルジイ アルテアナティーフ 流動床化学気相堆積によるナノ粒子の合成のためのデバイス
JP2018525625A (ja) * 2015-07-23 2018-09-06 清華大學Tsinghua University 被覆粒子を大規模に連続製造するシステム

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3021037C2 (de) * 1980-06-03 1982-06-16 Kernforschungsanlage Jülich GmbH, 5170 Jülich Vorrichtung und Verfahren zum Entladen eines Wirbelschichtofens für die Beschichtung von Hochtemperaturreaktor (HTR)-Brennstoffen
DE3040290C1 (de) * 1980-10-25 1982-07-22 Kernforschungsanlage Jülich GmbH, 5170 Jülich Entladevorrichtung fuer einen Wirbelschichtofen zur Beschichtung von Brennstoff- und Brutstoffkernen fuer Kernreaktoren
US5569329A (en) * 1995-06-06 1996-10-29 Carbomedics, Inc. Fluidized bed with uniform heat distribution and multiple port nozzle

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2062794C3 (de) * 1970-12-19 1975-09-04 Kernforschungsanlage Juelich Gmbh, 5170 Juelich Verfahren und Vorrichtung zum Beschichten von Brennstoffteilchen für Kernreaktoren
GB1439861A (en) * 1973-05-08 1976-06-16 Atomic Energy Authority Uk Fluidised bed apparatus
GB1477692A (en) * 1973-08-27 1977-06-22 Hobeg Hochtemperaturreaktor Method of and an apparatus for coating in a fluidised bed
GB1477493A (en) * 1974-08-02 1977-06-22 Atomic Energy Authority Uk Fluidised bed designs

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5617063A (en) * 1979-07-20 1981-02-18 Mitsubishi Electric Corp Manufacture of semiconductor device
JPS5892272A (ja) * 1981-11-27 1983-06-01 Mitsubishi Electric Corp 負帰還型GaAsマイクロ波モノリシツク増幅回路装置
JPS5892271A (ja) * 1981-11-27 1983-06-01 Mitsubishi Electric Corp GaAsマイクロ波モノリシツク集積回路装置
JP2006003092A (ja) * 2004-06-15 2006-01-05 Nuclear Fuel Ind Ltd 流動床装置の被覆燃料物質回収方法及び装置
JP2012505309A (ja) * 2008-10-09 2012-03-01 コミサリア ア レネルジィ アトミーク エ オ ゼネ ルジイ アルテアナティーフ 流動床化学気相堆積によるナノ粒子の合成のためのデバイス
US9039836B2 (en) 2008-10-09 2015-05-26 Commissariat A L'energie Atomique Et Aux Energies Alternatives Device for the synthesis of nanoparticles by fluidized-bed chemical vapor deposition
JP2018525625A (ja) * 2015-07-23 2018-09-06 清華大學Tsinghua University 被覆粒子を大規模に連続製造するシステム

Also Published As

Publication number Publication date
GB1581283A (en) 1980-12-10
DE2744611A1 (de) 1978-04-13
FR2366870A1 (fr) 1978-05-05
JPS6111661B2 (enExample) 1986-04-04

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