JPS5331188A - Measuring method for x-ray stress inside of tube - Google Patents

Measuring method for x-ray stress inside of tube

Info

Publication number
JPS5331188A
JPS5331188A JP10543076A JP10543076A JPS5331188A JP S5331188 A JPS5331188 A JP S5331188A JP 10543076 A JP10543076 A JP 10543076A JP 10543076 A JP10543076 A JP 10543076A JP S5331188 A JPS5331188 A JP S5331188A
Authority
JP
Japan
Prior art keywords
tube
measuring method
stress inside
ray stress
ray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10543076A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6118129B2 (enExample
Inventor
Toru Goto
Yasutsugu Kawabe
Ryoichi Shimizu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Mitsubishi Heavy Industries Ltd
Original Assignee
Shimadzu Corp
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp, Mitsubishi Heavy Industries Ltd filed Critical Shimadzu Corp
Priority to JP10543076A priority Critical patent/JPS5331188A/ja
Publication of JPS5331188A publication Critical patent/JPS5331188A/ja
Publication of JPS6118129B2 publication Critical patent/JPS6118129B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP10543076A 1976-09-04 1976-09-04 Measuring method for x-ray stress inside of tube Granted JPS5331188A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10543076A JPS5331188A (en) 1976-09-04 1976-09-04 Measuring method for x-ray stress inside of tube

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10543076A JPS5331188A (en) 1976-09-04 1976-09-04 Measuring method for x-ray stress inside of tube

Publications (2)

Publication Number Publication Date
JPS5331188A true JPS5331188A (en) 1978-03-24
JPS6118129B2 JPS6118129B2 (enExample) 1986-05-10

Family

ID=14407371

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10543076A Granted JPS5331188A (en) 1976-09-04 1976-09-04 Measuring method for x-ray stress inside of tube

Country Status (1)

Country Link
JP (1) JPS5331188A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5993314A (ja) * 1982-11-19 1984-05-29 Mitsui Toatsu Chem Inc ミキシングミルストリツプ自動切断運搬装置
JP2015137907A (ja) * 2014-01-22 2015-07-30 株式会社アールイーエス・ラボ 背面反射x線分析装置

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5408234B2 (ja) * 2011-11-29 2014-02-05 パルステック工業株式会社 X線回折測定装置及び残留応力測定方法
JP5569510B2 (ja) * 2011-11-29 2014-08-13 パルステック工業株式会社 X線回折測定装置
JP6308374B1 (ja) * 2016-12-02 2018-04-11 パルステック工業株式会社 X線回折測定方法及び回折環読取装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5034719A (enExample) * 1973-08-02 1975-04-03

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5034719A (enExample) * 1973-08-02 1975-04-03

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5993314A (ja) * 1982-11-19 1984-05-29 Mitsui Toatsu Chem Inc ミキシングミルストリツプ自動切断運搬装置
JP2015137907A (ja) * 2014-01-22 2015-07-30 株式会社アールイーエス・ラボ 背面反射x線分析装置

Also Published As

Publication number Publication date
JPS6118129B2 (enExample) 1986-05-10

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