JPS5324792B2 - - Google Patents
Info
- Publication number
- JPS5324792B2 JPS5324792B2 JP4611977A JP4611977A JPS5324792B2 JP S5324792 B2 JPS5324792 B2 JP S5324792B2 JP 4611977 A JP4611977 A JP 4611977A JP 4611977 A JP4611977 A JP 4611977A JP S5324792 B2 JPS5324792 B2 JP S5324792B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4611977A JPS52120686A (en) | 1977-04-21 | 1977-04-21 | Electronic ray exposure method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4611977A JPS52120686A (en) | 1977-04-21 | 1977-04-21 | Electronic ray exposure method |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3764176A Division JPS52122083A (en) | 1976-04-02 | 1976-04-02 | Electron beam exposing device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52120686A JPS52120686A (en) | 1977-10-11 |
JPS5324792B2 true JPS5324792B2 (ja) | 1978-07-22 |
Family
ID=12738097
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4611977A Granted JPS52120686A (en) | 1977-04-21 | 1977-04-21 | Electronic ray exposure method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52120686A (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5543821A (en) * | 1978-09-22 | 1980-03-27 | Hitachi Ltd | Electronic drawing device |
JPS55146931A (en) * | 1979-05-04 | 1980-11-15 | Hitachi Ltd | Depicting method by electronic beam |
JPS5746835U (ja) * | 1980-08-29 | 1982-03-16 | ||
JPS5748230A (en) * | 1980-09-04 | 1982-03-19 | Jeol Ltd | Electron ray exposure |
EP0053225B1 (en) * | 1980-11-28 | 1985-03-13 | International Business Machines Corporation | Electron beam system and method |
JPS56153739A (en) * | 1981-04-09 | 1981-11-27 | Fujitsu Ltd | Exposing method for electron beam |
JP4583936B2 (ja) * | 2005-01-06 | 2010-11-17 | 日本電子株式会社 | 荷電粒子ビーム装置及び荷電粒子ビーム装置の制御方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS501783A (ja) * | 1973-05-02 | 1975-01-09 | ||
JPS5093571A (ja) * | 1973-12-19 | 1975-07-25 | ||
JPS52122083A (en) * | 1976-04-02 | 1977-10-13 | Jeol Ltd | Electron beam exposing device |
-
1977
- 1977-04-21 JP JP4611977A patent/JPS52120686A/ja active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS501783A (ja) * | 1973-05-02 | 1975-01-09 | ||
JPS5093571A (ja) * | 1973-12-19 | 1975-07-25 | ||
JPS52122083A (en) * | 1976-04-02 | 1977-10-13 | Jeol Ltd | Electron beam exposing device |
Also Published As
Publication number | Publication date |
---|---|
JPS52120686A (en) | 1977-10-11 |