JPS5324782A - Forming method of high molecular film patterns by negative resist - Google Patents

Forming method of high molecular film patterns by negative resist

Info

Publication number
JPS5324782A
JPS5324782A JP9873676A JP9873676A JPS5324782A JP S5324782 A JPS5324782 A JP S5324782A JP 9873676 A JP9873676 A JP 9873676A JP 9873676 A JP9873676 A JP 9873676A JP S5324782 A JPS5324782 A JP S5324782A
Authority
JP
Japan
Prior art keywords
high molecular
film patterns
molecular film
forming method
negative resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9873676A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5531612B2 (enrdf_load_html_response
Inventor
Takeshi Sukegawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP9873676A priority Critical patent/JPS5324782A/ja
Publication of JPS5324782A publication Critical patent/JPS5324782A/ja
Publication of JPS5531612B2 publication Critical patent/JPS5531612B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP9873676A 1976-08-20 1976-08-20 Forming method of high molecular film patterns by negative resist Granted JPS5324782A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9873676A JPS5324782A (en) 1976-08-20 1976-08-20 Forming method of high molecular film patterns by negative resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9873676A JPS5324782A (en) 1976-08-20 1976-08-20 Forming method of high molecular film patterns by negative resist

Publications (2)

Publication Number Publication Date
JPS5324782A true JPS5324782A (en) 1978-03-07
JPS5531612B2 JPS5531612B2 (enrdf_load_html_response) 1980-08-19

Family

ID=14227783

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9873676A Granted JPS5324782A (en) 1976-08-20 1976-08-20 Forming method of high molecular film patterns by negative resist

Country Status (1)

Country Link
JP (1) JPS5324782A (enrdf_load_html_response)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5655044A (en) * 1979-10-11 1981-05-15 Fujitsu Ltd Formation of resist pattern
JPS58218119A (ja) * 1982-06-14 1983-12-19 Hitachi Ltd パタ−ン形成方法
JPS6091639A (ja) * 1983-10-26 1985-05-23 Alps Electric Co Ltd フオトレジストパタ−ンの形成方法
JPS62108525A (ja) * 1985-11-06 1987-05-19 Hitachi Ltd 表面処理方法およびその装置
JPH01193730A (ja) * 1988-01-29 1989-08-03 Sumitomo Bakelite Co Ltd ポリイミド樹脂の厚膜加工方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10684709B2 (en) 2015-12-22 2020-06-16 Shenzhen Royole Technologies Co., Ltd. Electronic bags

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5655044A (en) * 1979-10-11 1981-05-15 Fujitsu Ltd Formation of resist pattern
JPS58218119A (ja) * 1982-06-14 1983-12-19 Hitachi Ltd パタ−ン形成方法
JPS6091639A (ja) * 1983-10-26 1985-05-23 Alps Electric Co Ltd フオトレジストパタ−ンの形成方法
JPS62108525A (ja) * 1985-11-06 1987-05-19 Hitachi Ltd 表面処理方法およびその装置
JPH01193730A (ja) * 1988-01-29 1989-08-03 Sumitomo Bakelite Co Ltd ポリイミド樹脂の厚膜加工方法

Also Published As

Publication number Publication date
JPS5531612B2 (enrdf_load_html_response) 1980-08-19

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