JPS5320866A - Relative position deviation observing apparatus of patterns - Google Patents
Relative position deviation observing apparatus of patternsInfo
- Publication number
- JPS5320866A JPS5320866A JP9489176A JP9489176A JPS5320866A JP S5320866 A JPS5320866 A JP S5320866A JP 9489176 A JP9489176 A JP 9489176A JP 9489176 A JP9489176 A JP 9489176A JP S5320866 A JPS5320866 A JP S5320866A
- Authority
- JP
- Japan
- Prior art keywords
- patterns
- relative position
- position deviation
- observing apparatus
- deviation observing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To make easy the disposition mechanism of both objects each formed with patterns by increasing the spacing between both patterns which are superposedly disposed as well as to make possible the use of even said objects of poor flatness and yet obviate the degradation in relative position deviation observing accuracy.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9489176A JPS5320866A (en) | 1976-08-11 | 1976-08-11 | Relative position deviation observing apparatus of patterns |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9489176A JPS5320866A (en) | 1976-08-11 | 1976-08-11 | Relative position deviation observing apparatus of patterns |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5320866A true JPS5320866A (en) | 1978-02-25 |
Family
ID=14122653
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9489176A Pending JPS5320866A (en) | 1976-08-11 | 1976-08-11 | Relative position deviation observing apparatus of patterns |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5320866A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54114423A (en) * | 1978-02-27 | 1979-09-06 | Nippon Steel Corp | Production of ferritic stainless steel free of ridging |
JPS5863559U (en) * | 1981-10-24 | 1983-04-28 | 株式会社島津製作所 | X-ray fluoroscope |
JP2009288301A (en) * | 2008-05-27 | 2009-12-10 | V Technology Co Ltd | Proximity exposure apparatus |
JP2011003605A (en) * | 2009-06-16 | 2011-01-06 | Hitachi High-Technologies Corp | Proximity aligner, alignment method for proximity aligner, and manufacturing method for display panel board |
-
1976
- 1976-08-11 JP JP9489176A patent/JPS5320866A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54114423A (en) * | 1978-02-27 | 1979-09-06 | Nippon Steel Corp | Production of ferritic stainless steel free of ridging |
JPS5761096B2 (en) * | 1978-02-27 | 1982-12-22 | Nippon Steel Corp | |
JPS5863559U (en) * | 1981-10-24 | 1983-04-28 | 株式会社島津製作所 | X-ray fluoroscope |
JPS6336266Y2 (en) * | 1981-10-24 | 1988-09-27 | ||
JP2009288301A (en) * | 2008-05-27 | 2009-12-10 | V Technology Co Ltd | Proximity exposure apparatus |
JP2011003605A (en) * | 2009-06-16 | 2011-01-06 | Hitachi High-Technologies Corp | Proximity aligner, alignment method for proximity aligner, and manufacturing method for display panel board |
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