JPS5320376A - Large dose radiation measuring system of wide dose region - Google Patents

Large dose radiation measuring system of wide dose region

Info

Publication number
JPS5320376A
JPS5320376A JP9451576A JP9451576A JPS5320376A JP S5320376 A JPS5320376 A JP S5320376A JP 9451576 A JP9451576 A JP 9451576A JP 9451576 A JP9451576 A JP 9451576A JP S5320376 A JPS5320376 A JP S5320376A
Authority
JP
Japan
Prior art keywords
dose
measuring system
radiation measuring
wide
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9451576A
Other languages
Japanese (ja)
Other versions
JPS5518876B2 (en
Inventor
Takio Tomimasu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP9451576A priority Critical patent/JPS5320376A/en
Publication of JPS5320376A publication Critical patent/JPS5320376A/en
Publication of JPS5518876B2 publication Critical patent/JPS5518876B2/ja
Granted legal-status Critical Current

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  • Measurement Of Radiation (AREA)

Abstract

PURPOSE: To achieve the enlargement of a measuring range by usuing a P-N junction type diode PNJD of a controlled impurity concentration.
COPYRIGHT: (C)1978,JPO&Japio
JP9451576A 1976-08-10 1976-08-10 Large dose radiation measuring system of wide dose region Granted JPS5320376A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9451576A JPS5320376A (en) 1976-08-10 1976-08-10 Large dose radiation measuring system of wide dose region

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9451576A JPS5320376A (en) 1976-08-10 1976-08-10 Large dose radiation measuring system of wide dose region

Publications (2)

Publication Number Publication Date
JPS5320376A true JPS5320376A (en) 1978-02-24
JPS5518876B2 JPS5518876B2 (en) 1980-05-22

Family

ID=14112450

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9451576A Granted JPS5320376A (en) 1976-08-10 1976-08-10 Large dose radiation measuring system of wide dose region

Country Status (1)

Country Link
JP (1) JPS5320376A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02275631A (en) * 1989-01-11 1990-11-09 Dainippon Screen Mfg Co Ltd Method and device for washing and treating substrate

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3086117A (en) * 1959-07-20 1963-04-16 Raytheon Co Semiconductive dosimeters

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3086117A (en) * 1959-07-20 1963-04-16 Raytheon Co Semiconductive dosimeters

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02275631A (en) * 1989-01-11 1990-11-09 Dainippon Screen Mfg Co Ltd Method and device for washing and treating substrate

Also Published As

Publication number Publication date
JPS5518876B2 (en) 1980-05-22

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