JPS53138676A - Method of developing photoresist - Google Patents

Method of developing photoresist

Info

Publication number
JPS53138676A
JPS53138676A JP5331378A JP5331378A JPS53138676A JP S53138676 A JPS53138676 A JP S53138676A JP 5331378 A JP5331378 A JP 5331378A JP 5331378 A JP5331378 A JP 5331378A JP S53138676 A JPS53138676 A JP S53138676A
Authority
JP
Japan
Prior art keywords
developing photoresist
photoresist
developing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5331378A
Other languages
English (en)
Japanese (ja)
Inventor
Ii Banda Mei Jiyon
Aaru Shiebei Uiriamu
Daburiyuu Andaasun Roorando
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honeywell International Inc
Original Assignee
Allied Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Allied Chemical Corp filed Critical Allied Chemical Corp
Publication of JPS53138676A publication Critical patent/JPS53138676A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP5331378A 1977-05-06 1978-05-06 Method of developing photoresist Pending JPS53138676A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US79468277A 1977-05-06 1977-05-06

Publications (1)

Publication Number Publication Date
JPS53138676A true JPS53138676A (en) 1978-12-04

Family

ID=25163339

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5331378A Pending JPS53138676A (en) 1977-05-06 1978-05-06 Method of developing photoresist

Country Status (5)

Country Link
JP (1) JPS53138676A (enrdf_load_stackoverflow)
DE (1) DE2817256A1 (enrdf_load_stackoverflow)
FR (1) FR2389926A1 (enrdf_load_stackoverflow)
GB (1) GB1595887A (enrdf_load_stackoverflow)
HK (1) HK9483A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55155353A (en) * 1979-05-22 1980-12-03 Tokyo Ohka Kogyo Co Ltd Developer composition

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3924889A1 (de) * 1989-07-27 1991-01-31 Kali Chemie Ag Reinigungszusammensetzungen aus dichlortrifluorenthanen und alkanolen

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3607767A (en) * 1969-10-10 1971-09-21 Union Carbide Corp Azeothropic composition of 1,1,2-trifluoroethane,methylene chloride,and cyclopentane
JPS4988603A (enrdf_load_stackoverflow) * 1972-12-29 1974-08-24
DE2418609A1 (de) * 1974-04-18 1975-10-30 Grace W R & Co Verfahren zur herstellung lichtempfindlicher deckschichten

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55155353A (en) * 1979-05-22 1980-12-03 Tokyo Ohka Kogyo Co Ltd Developer composition

Also Published As

Publication number Publication date
HK9483A (en) 1983-03-17
GB1595887A (en) 1981-08-19
FR2389926A1 (enrdf_load_stackoverflow) 1978-12-01
DE2817256A1 (de) 1978-11-09

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