FR2389926A1 - - Google Patents
Info
- Publication number
- FR2389926A1 FR2389926A1 FR7813218A FR7813218A FR2389926A1 FR 2389926 A1 FR2389926 A1 FR 2389926A1 FR 7813218 A FR7813218 A FR 7813218A FR 7813218 A FR7813218 A FR 7813218A FR 2389926 A1 FR2389926 A1 FR 2389926A1
- Authority
- FR
- France
- Prior art keywords
- photosensitive masking
- sensitizing
- products
- xylene
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000000873 masking effect Effects 0.000 abstract 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 abstract 3
- 230000001235 sensitizing effect Effects 0.000 abstract 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 abstract 2
- 239000007788 liquid Substances 0.000 abstract 2
- 239000002904 solvent Substances 0.000 abstract 2
- 239000008096 xylene Substances 0.000 abstract 2
- SLGOCMATMKJJCE-UHFFFAOYSA-N 1,1,1,2-tetrachloro-2,2-difluoroethane Chemical compound FC(F)(Cl)C(Cl)(Cl)Cl SLGOCMATMKJJCE-UHFFFAOYSA-N 0.000 abstract 1
- BOSAWIQFTJIYIS-UHFFFAOYSA-N 1,1,1-trichloro-2,2,2-trifluoroethane Chemical compound FC(F)(F)C(Cl)(Cl)Cl BOSAWIQFTJIYIS-UHFFFAOYSA-N 0.000 abstract 1
- DDMOUSALMHHKOS-UHFFFAOYSA-N 1,2-dichloro-1,1,2,2-tetrafluoroethane Chemical compound FC(F)(Cl)C(F)(F)Cl DDMOUSALMHHKOS-UHFFFAOYSA-N 0.000 abstract 1
- -1 aliphatic halogenated hydrocarbon Chemical class 0.000 abstract 1
- 229940087091 dichlorotetrafluoroethane Drugs 0.000 abstract 1
- 150000008282 halocarbons Chemical class 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 239000011368 organic material Substances 0.000 abstract 1
- CYRMSUTZVYGINF-UHFFFAOYSA-N trichlorofluoromethane Chemical compound FC(Cl)(Cl)Cl CYRMSUTZVYGINF-UHFFFAOYSA-N 0.000 abstract 1
- 229940029284 trichlorofluoromethane Drugs 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US79468277A | 1977-05-06 | 1977-05-06 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| FR2389926A1 true FR2389926A1 (enrdf_load_stackoverflow) | 1978-12-01 |
Family
ID=25163339
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7813218A Withdrawn FR2389926A1 (enrdf_load_stackoverflow) | 1977-05-06 | 1978-05-03 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS53138676A (enrdf_load_stackoverflow) |
| DE (1) | DE2817256A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2389926A1 (enrdf_load_stackoverflow) |
| GB (1) | GB1595887A (enrdf_load_stackoverflow) |
| HK (1) | HK9483A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55155353A (en) * | 1979-05-22 | 1980-12-03 | Tokyo Ohka Kogyo Co Ltd | Developer composition |
| DE3924889A1 (de) * | 1989-07-27 | 1991-01-31 | Kali Chemie Ag | Reinigungszusammensetzungen aus dichlortrifluorenthanen und alkanolen |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3607767A (en) * | 1969-10-10 | 1971-09-21 | Union Carbide Corp | Azeothropic composition of 1,1,2-trifluoroethane,methylene chloride,and cyclopentane |
| DE2364631A1 (de) * | 1972-12-29 | 1974-07-04 | Fuji Photo Film Co Ltd | Entwicklerzusammensetzung fuer ein lichtempfindliches lithographisches druckmaterial |
| DE2418609A1 (de) * | 1974-04-18 | 1975-10-30 | Grace W R & Co | Verfahren zur herstellung lichtempfindlicher deckschichten |
-
1978
- 1978-04-20 DE DE19782817256 patent/DE2817256A1/de not_active Withdrawn
- 1978-05-03 GB GB1756978A patent/GB1595887A/en not_active Expired
- 1978-05-03 FR FR7813218A patent/FR2389926A1/fr not_active Withdrawn
- 1978-05-06 JP JP5331378A patent/JPS53138676A/ja active Pending
-
1983
- 1983-03-17 HK HK9483A patent/HK9483A/xx unknown
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3607767A (en) * | 1969-10-10 | 1971-09-21 | Union Carbide Corp | Azeothropic composition of 1,1,2-trifluoroethane,methylene chloride,and cyclopentane |
| DE2364631A1 (de) * | 1972-12-29 | 1974-07-04 | Fuji Photo Film Co Ltd | Entwicklerzusammensetzung fuer ein lichtempfindliches lithographisches druckmaterial |
| DE2418609A1 (de) * | 1974-04-18 | 1975-10-30 | Grace W R & Co | Verfahren zur herstellung lichtempfindlicher deckschichten |
Non-Patent Citations (1)
| Title |
|---|
| EXBK/69 * |
Also Published As
| Publication number | Publication date |
|---|---|
| HK9483A (en) | 1983-03-17 |
| JPS53138676A (en) | 1978-12-04 |
| GB1595887A (en) | 1981-08-19 |
| DE2817256A1 (de) | 1978-11-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| CD | Change of name or company name | ||
| ST | Notification of lapse |