JPS53136971A - Semiconductor wafer and device for positioning electron beam at desired position with respect to said wafer - Google Patents
Semiconductor wafer and device for positioning electron beam at desired position with respect to said waferInfo
- Publication number
- JPS53136971A JPS53136971A JP5902178A JP5902178A JPS53136971A JP S53136971 A JPS53136971 A JP S53136971A JP 5902178 A JP5902178 A JP 5902178A JP 5902178 A JP5902178 A JP 5902178A JP S53136971 A JPS53136971 A JP S53136971A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- respect
- electron beam
- desired position
- semiconductor wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
- G05B19/19—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path
- G05B19/39—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path using a combination of the means covered by at least two of the preceding groups G05B19/21, G05B19/27 and G05B19/33
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/34—Director, elements to supervisory
- G05B2219/34388—Detect correct moment, position, advanced, delayed, then next command
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/41—Servomotor, servo controller till figures
- G05B2219/41457—Superposition of movement
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/42—Servomotor, servo controller kind till VSS
- G05B2219/42249—Relative positioning
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/42—Servomotor, servo controller kind till VSS
- G05B2219/42251—Control position of beam in coordination with xy slide
Landscapes
- Engineering & Computer Science (AREA)
- Human Computer Interaction (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Electron Beam Exposure (AREA)
- Control Of Position Or Direction (AREA)
- Automatic Control Of Machine Tools (AREA)
- Numerical Control (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US395502A US3886421A (en) | 1973-09-10 | 1973-09-10 | Precision tool and workpiece positioning apparatus with ringout detection |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS53136971A true JPS53136971A (en) | 1978-11-29 |
JPS545267B2 JPS545267B2 (ja) | 1979-03-15 |
Family
ID=23563317
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8991774A Expired JPS5517965B2 (ja) | 1973-09-10 | 1974-08-07 | |
JP5902178A Granted JPS53136971A (en) | 1973-09-10 | 1978-05-19 | Semiconductor wafer and device for positioning electron beam at desired position with respect to said wafer |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8991774A Expired JPS5517965B2 (ja) | 1973-09-10 | 1974-08-07 |
Country Status (4)
Country | Link |
---|---|
US (1) | US3886421A (ja) |
JP (2) | JPS5517965B2 (ja) |
CA (1) | CA1032635A (ja) |
NL (1) | NL7411712A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01216530A (ja) * | 1988-02-25 | 1989-08-30 | Jeol Ltd | 描画装置用移動ステージ |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53110381A (en) * | 1977-03-08 | 1978-09-27 | Nippon Telegr & Teleph Corp <Ntt> | Position control device for electron beam exposure unit |
JPS5518031A (en) * | 1978-07-25 | 1980-02-07 | Jeol Ltd | Stage shifting device in electron beam device |
JPS5517399U (ja) * | 1979-08-13 | 1980-02-04 | ||
DE3039400C2 (de) * | 1980-10-18 | 1984-10-04 | Ludwig Dr.-Ing. 7500 Karlsruhe Pietzsch | Verfahren zum Steuern von Handhabungssystemen und Handhabungssystem zur Durchführung dieses Verfahrens |
JPS61287675A (ja) * | 1985-06-12 | 1986-12-18 | 株式会社日立製作所 | エレベ−タの位置検出装置 |
US6320345B1 (en) | 1998-03-05 | 2001-11-20 | Nikon Corporation | Command trajectory for driving a stage with minimal vibration |
US6008610A (en) * | 1998-03-20 | 1999-12-28 | Nikon Corporation | Position control apparatus for fine stages carried by a coarse stage on a high-precision scanning positioning system |
US6260282B1 (en) | 1998-03-27 | 2001-07-17 | Nikon Corporation | Stage control with reduced synchronization error and settling time |
US6835912B2 (en) * | 2002-05-28 | 2004-12-28 | Trumpf, Inc. | Laser cutting machine with two Y-axis drives |
US20050103764A1 (en) * | 2003-10-01 | 2005-05-19 | Trumpf, Inc. | Laser cutting machine with two X-axis drives |
JP2005203567A (ja) * | 2004-01-15 | 2005-07-28 | Canon Inc | 駆動装置、露光装置及びデバイス製造方法 |
US20090192644A1 (en) * | 2008-01-30 | 2009-07-30 | Meyer Thomas J | Method and system for manufacturing an article using portable hand-held tools |
TWI410295B (zh) * | 2010-05-27 | 2013-10-01 | Univ Nat Formosa | Two - degree - of - freedom nano - level piezoelectric alignment platform mechanism |
EP3060513B1 (en) | 2013-10-25 | 2017-07-05 | Transformix Engineering Inc. | Flexible feeding and closing machine for hinged caps |
CA2995268C (en) * | 2014-08-12 | 2022-05-10 | Transformix Engineering Inc. | Computer numerical control assembly or processing of components |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB816360A (en) * | 1956-07-06 | 1959-07-08 | Acec | Electric remote-control positioning system |
JPS4734960U (ja) * | 1971-05-14 | 1972-12-19 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2674708A (en) * | 1951-10-29 | 1954-04-06 | Honeywell Regulator Co | Damping arrangement for electric motor follow-up systems |
US3142018A (en) * | 1961-01-24 | 1964-07-21 | Seneca Falls Machine Co | Fine and coarse positional servo system |
US3323030A (en) * | 1963-12-23 | 1967-05-30 | Fujitsu Ltd | Digital fine and coarse servo motor control system |
CH436751A (de) * | 1966-05-31 | 1967-05-31 | Contraves Ag | Koordinatograph |
DE1804646B2 (de) * | 1968-10-18 | 1973-03-22 | Siemens AG, 1000 Berlin u. 8000 München | Korpuskularstrahl-bearbeitungsgeraet |
US3733484A (en) * | 1969-10-29 | 1973-05-15 | Walter C Mc Crone Associates I | Control for electron microprobe |
FR2098524A5 (ja) * | 1970-07-17 | 1972-03-10 | Thomson Csf |
-
1973
- 1973-09-10 US US395502A patent/US3886421A/en not_active Expired - Lifetime
-
1974
- 1974-08-07 JP JP8991774A patent/JPS5517965B2/ja not_active Expired
- 1974-08-13 CA CA206,917A patent/CA1032635A/en not_active Expired
- 1974-09-04 NL NL7411712A patent/NL7411712A/xx not_active Application Discontinuation
-
1978
- 1978-05-19 JP JP5902178A patent/JPS53136971A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB816360A (en) * | 1956-07-06 | 1959-07-08 | Acec | Electric remote-control positioning system |
JPS4734960U (ja) * | 1971-05-14 | 1972-12-19 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01216530A (ja) * | 1988-02-25 | 1989-08-30 | Jeol Ltd | 描画装置用移動ステージ |
Also Published As
Publication number | Publication date |
---|---|
CA1032635A (en) | 1978-06-06 |
US3886421A (en) | 1975-05-27 |
NL7411712A (nl) | 1975-03-12 |
JPS545267B2 (ja) | 1979-03-15 |
JPS5054782A (ja) | 1975-05-14 |
JPS5517965B2 (ja) | 1980-05-15 |
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