CA838346A - Process for fabricating semiconductor wafer with oxide-isolated monocrystalline region - Google Patents

Process for fabricating semiconductor wafer with oxide-isolated monocrystalline region

Info

Publication number
CA838346A
CA838346A CA838346A CA838346DA CA838346A CA 838346 A CA838346 A CA 838346A CA 838346 A CA838346 A CA 838346A CA 838346D A CA838346D A CA 838346DA CA 838346 A CA838346 A CA 838346A
Authority
CA
Canada
Prior art keywords
oxide
semiconductor wafer
fabricating semiconductor
monocrystalline region
isolated monocrystalline
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA838346A
Inventor
L. Schnable George
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Maxar Space LLC
Original Assignee
Philco Ford Corp
Publication date
Application granted granted Critical
Publication of CA838346A publication Critical patent/CA838346A/en
Expired legal-status Critical Current

Links

CA838346A Process for fabricating semiconductor wafer with oxide-isolated monocrystalline region Expired CA838346A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA838346T

Publications (1)

Publication Number Publication Date
CA838346A true CA838346A (en) 1970-03-31

Family

ID=36322542

Family Applications (1)

Application Number Title Priority Date Filing Date
CA838346A Expired CA838346A (en) Process for fabricating semiconductor wafer with oxide-isolated monocrystalline region

Country Status (1)

Country Link
CA (1) CA838346A (en)

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